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Properties of TiO2 thin films prepared by magnetron sputtering
W. J. Zhang; Y. Li; F. H. Wang
2002
发表期刊Journal of Materials Science & Technology
ISSN1005-0302
卷号18期号:2页码:101-107
摘要With rapid progressive application of TiO2 thin films, magnetron sputtering becomes a very interesting method to prepare such multi-functional thin films. This paper focuses on influences of various deposition processes and deposition rate on the structures and properties of TiO2 thin films. Anatase, rutile or amorphous TiO2 films with various crystalline structures and different photocatalytic, optical and electrical properties can be produced by varying sputtering gases, substrate temperature, annealing process, deposition rate and the characteristics of magnetron sputtering. This may in turn affect the functions of TiO2 films in many applications. Furthermore, TiO2-based composites films can overcome many limitations and improve the properties of TiO2 films.
部门归属chinese acad sci, met res inst, state key lab corros & protect, shenyang 110016, peoples r china.;wang, fh (reprint author), chinese acad sci, met res inst, state key lab corros & protect, shenyang 110016, peoples r china
关键词Tio2 Thin Film Magnetron Sputtering Deposition Process Composite Film Optical-properties Heterogeneous Photocatalysis Substrate-temperature Cosputtering Method Titanium-dioxide Deposition Oxidation Frequency Water Ion
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WOS记录号WOS:000174881400003
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被引频次:45[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.imr.ac.cn/handle/321006/36551
专题中国科学院金属研究所
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W. J. Zhang,Y. Li,F. H. Wang. Properties of TiO2 thin films prepared by magnetron sputtering[J]. Journal of Materials Science & Technology,2002,18(2):101-107.
APA W. J. Zhang,Y. Li,&F. H. Wang.(2002).Properties of TiO2 thin films prepared by magnetron sputtering.Journal of Materials Science & Technology,18(2),101-107.
MLA W. J. Zhang,et al."Properties of TiO2 thin films prepared by magnetron sputtering".Journal of Materials Science & Technology 18.2(2002):101-107.
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