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Shear-activated indentation crack in GaAs single crystal
Z. C. Li; L. Liu; L. L. He; Y. B. Xu; X. Wu
2001
发表期刊Journal of Materials Research
ISSN0884-2914
卷号16期号:10页码:2845-2849
摘要Cracks induced by 0.049N load indentation on the surface of gallium arsenide single crystal were investigated before and after annealing. The results revealed that the crack initiation essentially relates to the shear deformation during indentation. There were dislocation generation, lattice distortion, and the transformation from crystalline to disordered structure, leading, to the occurrence of an amorphous band in front of the crack tip. After being annealed at 500 degreesC for 60 min, the amorphous band disappeared, and instead, recrystallized grains appeared along the crack-propagation direction. It is reasonable to propose that crack propagation is the result of the decohesion of the amorphous band rather than the direct debonding along a certain atomic plane.
部门归属chinese acad sci, inst met res, shenyang natl lab mat sci, shenyang 110016, peoples r china. wayne state univ, dept mech & engn, detroit, mi 48202 usa.;li, zc (reprint author), chinese acad sci, inst met res, shenyang natl lab mat sci, shenyang 110016, peoples r china;zhchli@imr.ac.cn
关键词Electron-microscopy Ductile Transition Silicon Fracture Tips
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WOS记录号WOS:000171429600018
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被引频次:11[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.imr.ac.cn/handle/321006/36710
专题中国科学院金属研究所
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Z. C. Li,L. Liu,L. L. He,et al. Shear-activated indentation crack in GaAs single crystal[J]. Journal of Materials Research,2001,16(10):2845-2849.
APA Z. C. Li,L. Liu,L. L. He,Y. B. Xu,&X. Wu.(2001).Shear-activated indentation crack in GaAs single crystal.Journal of Materials Research,16(10),2845-2849.
MLA Z. C. Li,et al."Shear-activated indentation crack in GaAs single crystal".Journal of Materials Research 16.10(2001):2845-2849.
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