Microstructural development inside the stress induced martensite variant in a Ti-Ni-Nb shape memory alloy

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	Microstructural development inside the stress induced martensite variant in a Ti-Ni-Nb shape memory alloy
	Y. F. Zheng; W. Cai; J. X. Zhang; L. C. Zhao; H. Q. Ye
	2000
发表期刊	Acta Materialia
ISSN	1359-6454
卷号	48 期号:6 页码:1409-1425
摘要	The microstructural development inside the stress induced martensite (SIM) variants in Ti-Ni-Nb alloy with various degrees of deformation have been revealed by electron microscopic observations. The orientation relationship between the SIM and the parent phase has been found: [1(1) over bar 0](M)//[11(1) over bar](B2), (001)(M) 5 degrees away from (101)(B2) The lattice invariant shear of the SIM variants at the slightly deformed stage is dominantly (11(1) over bar) Type I twin. Besides the ordinary slip, the adjustment and development of the internal secondary twinning from (11(1) over bar) Type I twin to [011] Type II/or (011) Type I twin, (001) compound twin and (111)Type I twin happen concurrently or in combination inside the SIM variants with the further deformation. The corresponding deformation mechanisms include stress induced reorientation of SIM substructural bands by the most favorably oriented twin system, stress induced migration of the SIM substructural boundary through internal twinning and stress induced injection of foreign SIM variant to the preexisting substructural bands. (C) 2000 Acta Metallurgica Inc. Published by Elsevier Science Ltd. All rights reserved.
部门归属	harbin inst technol, sch mat sci & engn, harbin 150001, peoples r china. acad sinica, inst met res, atom imaging solids lab, shenyang 110015, peoples r china.;zheng, yf (reprint author), harbin inst technol, sch mat sci & engn, harbin 150001, peoples r china
关键词	Shape Memory Martensite Microstructure Interface Transmission Electron Microscopy (Tem) Electron-microscopy Crystal-structure Wide-hysteresis Nickel-titanium B19' Martensite Transformation Deformation Crystallography Temperature Mechanism
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WOS记录号	WOS:000086265100016
引用统计	被引频次：41[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/37287
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	Y. F. Zheng,W. Cai,J. X. Zhang,et al. Microstructural development inside the stress induced martensite variant in a Ti-Ni-Nb shape memory alloy[J]. Acta Materialia,2000,48(6):1409-1425.
APA	Y. F. Zheng,W. Cai,J. X. Zhang,L. C. Zhao,&H. Q. Ye.(2000).Microstructural development inside the stress induced martensite variant in a Ti-Ni-Nb shape memory alloy.Acta Materialia,48(6),1409-1425.
MLA	Y. F. Zheng,et al."Microstructural development inside the stress induced martensite variant in a Ti-Ni-Nb shape memory alloy".Acta Materialia 48.6(2000):1409-1425.