Electric degradation behavior of hot filament in diamond chemical vapor deposition

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	Electric degradation behavior of hot filament in diamond chemical vapor deposition
	G. C. Chen; R. F. Huang; L. S. Wen
	1999
发表期刊	Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films
ISSN	0734-2101
卷号	17 期号:5 页码:3108-3110
部门归属	acad sinica, inst met res, shenyang 110015, peoples r china.;chen, gc (reprint author), inst phys, grp 106, beijing 100080, peoples r china
关键词	Growth Mechanism Hydrogen C-13 Cvd
URL	查看原文
WOS记录号	WOS:000082596600104
引用统计
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/37315
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	G. C. Chen,R. F. Huang,L. S. Wen. Electric degradation behavior of hot filament in diamond chemical vapor deposition[J]. Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films,1999,17(5):3108-3110.
APA	G. C. Chen,R. F. Huang,&L. S. Wen.(1999).Electric degradation behavior of hot filament in diamond chemical vapor deposition.Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films,17(5),3108-3110.
MLA	G. C. Chen,et al."Electric degradation behavior of hot filament in diamond chemical vapor deposition".Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films 17.5(1999):3108-3110.