The deposition of oriented diamond film by hot-filament chemical vapor deposition with separate reactant gas | |
G. C. Chen; C. Sun; R. F. Huang; L. S. Wen; D. Y. Jiang; X. Z. Yao | |
1999 | |
发表期刊 | Journal of Materials Research
![]() |
ISSN | 0884-2914 |
卷号 | 14期号:8页码:3196-3199 |
摘要 | A (110)-oriented diamond film was deposited by hot filament chemical vapor deposition with H-2 and CH4 separately introduced into the reactive zone. The film with a degree of orientation I-(220)/I-(111) of more than 200% and deposition rate of 2-3 mu m/h was obtained for a deposition time of 17 h. The long deposition time enlarged the grain size and enhanced the degree of orientation, but too long a deposition time resulted in random growth. The temperature field was measured and also calculated using a simple model. Both results showed that a temperature field existed with varied gradients along the normal of substrate surface. The (110)-oriented diamond film was deposited in the zone with negative temperature gradient. The change in orientation occurring for long deposition times was ascribed to the change of temperature gradient. |
部门归属 | acad sinica, inst met res, shenyang 110015, peoples r china. acad sinica, inst phys, beijing 100080, peoples r china.;chen, gc (reprint author), inst phys, grp 106, beijing, peoples r china |
关键词 | Growth Morphology Mechanism Surfaces Si(100) Plasma C-13 Cvd |
URL | 查看原文 |
WOS记录号 | WOS:000082550800005 |
引用统计 | |
文献类型 | 期刊论文 |
条目标识符 | http://ir.imr.ac.cn/handle/321006/37316 |
专题 | 中国科学院金属研究所 |
推荐引用方式 GB/T 7714 | G. C. Chen,C. Sun,R. F. Huang,et al. The deposition of oriented diamond film by hot-filament chemical vapor deposition with separate reactant gas[J]. Journal of Materials Research,1999,14(8):3196-3199. |
APA | G. C. Chen,C. Sun,R. F. Huang,L. S. Wen,D. Y. Jiang,&X. Z. Yao.(1999).The deposition of oriented diamond film by hot-filament chemical vapor deposition with separate reactant gas.Journal of Materials Research,14(8),3196-3199. |
MLA | G. C. Chen,et al."The deposition of oriented diamond film by hot-filament chemical vapor deposition with separate reactant gas".Journal of Materials Research 14.8(1999):3196-3199. |
条目包含的文件 | 条目无相关文件。 |
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。
修改评论