Abnormal steady states in reactive sputtering

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	Abnormal steady states in reactive sputtering
	S. L. Zhu; F. H. Wang; W. T. Wu
	1999
发表期刊	Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films
ISSN	0734-2101
卷号	17 期号:1 页码:70-76
摘要	For a sputter system equipped with a constant current power supply and under reactive gas how control, certain compositions of film are usually not accessible in the normal steady states because;of the transition of steady state and the hysteresis effect. Theoretical studies in this article indicated that there exist abnormal steady states where films of intermediate compound contents may possibly be produced. However, the experimental endeavors to attain these states in a system under current/flow control failed. Further theoretical studies in this work indicated that not only are the abnormal steady states difficult to establish, but also they are sensitive to tiny drifts in parameter. In other words, in a sputter system with constant discharge current and constant reactive gas flow, the abnormal steady states can only be achieved and maintained when the parameters are set and kept in point sharply. These theoretical results revealed why it is not practically possible to operate steadily between the metal sputtering region and the compound sputtering region when a sputter system is under flow/current control. (C) 1999 American Vacuum Society. [S0734-2101(99>00301-2].
部门归属	chinese acad sci, young scientists lab surface engn, shenyang 110015, peoples r china. chinese acad sci, inst corros & protect met, state key lab corros & protect, shenyang 110015, peoples r china.;zhu, sl (reprint author), chinese acad sci, young scientists lab surface engn, shenyang 110015, peoples r china
关键词	Titanium Nitride Partial-pressure Deposition Films
URL	查看原文
WOS记录号	WOS:000078136300010
引用统计	被引频次：10[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/37622
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	S. L. Zhu,F. H. Wang,W. T. Wu. Abnormal steady states in reactive sputtering[J]. Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films,1999,17(1):70-76.
APA	S. L. Zhu,F. H. Wang,&W. T. Wu.(1999).Abnormal steady states in reactive sputtering.Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films,17(1),70-76.
MLA	S. L. Zhu,et al."Abnormal steady states in reactive sputtering".Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films 17.1(1999):70-76.