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Fatigue behaviors of a copper tricrystal - Part II - Crystallographic fatigue crack growth in the vicinity of the triple junction
W. P. Jia; S. X. Li; Z. G. Wang; G. Y. Li
1998
Source PublicationJournal of Materials Science Letters
ISSN0261-8028
Volume17Issue:12Pages:1041-1044
description.departmentacad sinica, inst met res, state key lab fatigue & fracture mat, shenyang 110015, peoples r china.;jia, wp (reprint author), acad sinica, inst met res, state key lab fatigue & fracture mat, shenyang 110015, peoples r china
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WOS IDWOS:000078836600019
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Cited Times:9[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/37685
Collection中国科学院金属研究所
Recommended Citation
GB/T 7714
W. P. Jia,S. X. Li,Z. G. Wang,et al. Fatigue behaviors of a copper tricrystal - Part II - Crystallographic fatigue crack growth in the vicinity of the triple junction[J]. Journal of Materials Science Letters,1998,17(12):1041-1044.
APA W. P. Jia,S. X. Li,Z. G. Wang,&G. Y. Li.(1998).Fatigue behaviors of a copper tricrystal - Part II - Crystallographic fatigue crack growth in the vicinity of the triple junction.Journal of Materials Science Letters,17(12),1041-1044.
MLA W. P. Jia,et al."Fatigue behaviors of a copper tricrystal - Part II - Crystallographic fatigue crack growth in the vicinity of the triple junction".Journal of Materials Science Letters 17.12(1998):1041-1044.
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