Electrochemical deposition and microstructure of copper (I) oxide films

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	Electrochemical deposition and microstructure of copper (I) oxide films
	Y. C. Zhou; J. A. Switzer
	1998
发表期刊	Scripta Materialia
ISSN	1359-6462
卷号	38 期号:11 页码:1731-1738
部门归属	chinese acad sci, inst met res, shenyang 110015, peoples r china. univ missouri, dept chem, rolla, mo 65401 usa. univ missouri, grad ctr mat res, rolla, mo 65401 usa.;zhou, yc (reprint author), chinese acad sci, inst met res, 72 wenhua rd, shenyang 110015, peoples r china
关键词	Superlattices
URL	查看原文
WOS记录号	WOS:000073817800018
引用统计	被引频次：93[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/37925
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	Y. C. Zhou,J. A. Switzer. Electrochemical deposition and microstructure of copper (I) oxide films[J]. Scripta Materialia,1998,38(11):1731-1738.
APA	Y. C. Zhou,&J. A. Switzer.(1998).Electrochemical deposition and microstructure of copper (I) oxide films.Scripta Materialia,38(11),1731-1738.
MLA	Y. C. Zhou,et al."Electrochemical deposition and microstructure of copper (I) oxide films".Scripta Materialia 38.11(1998):1731-1738.