| Effect of deposition temperature on phase formation in Nb/Si multilayers | |
| M. Zhang; W. Yu; W. K. Wang | |
| 1997 | |
| 发表期刊 | Journal of Materials Science Letters
 |
| ISSN | 0261-8028 |
| 卷号 | 16期号:3页码:241-243 |
| 部门归属 | acad sinica,int ctr mat phys,shenyang 110015,peoples r china.;zhang, m (reprint author), chinese acad sci,inst phys,beijing 100080,peoples r china |
| 关键词 | Thin-films Interfacial Reactions Silicide Formation Initial-stage Metal (111)Si Nucleation Diffusion Systems |
| URL | 查看原文 |
| 文献类型 | 期刊论文 |
| 条目标识符 | http://ir.imr.ac.cn/handle/321006/38210 |
| 专题 | 中国科学院金属研究所 |
| 推荐引用方式 GB/T 7714 | M. Zhang,W. Yu,W. K. Wang. Effect of deposition temperature on phase formation in Nb/Si multilayers[J]. Journal of Materials Science Letters,1997,16(3):241-243. |
| APA | M. Zhang,W. Yu,&W. K. Wang.(1997).Effect of deposition temperature on phase formation in Nb/Si multilayers.Journal of Materials Science Letters,16(3),241-243. |
| MLA | M. Zhang,et al."Effect of deposition temperature on phase formation in Nb/Si multilayers".Journal of Materials Science Letters 16.3(1997):241-243. |
| 条目包含的文件 | 条目无相关文件。 | |||||
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