On the relation between preferential emission and bulk composition in binary alloy sputtering

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	On the relation between preferential emission and bulk composition in binary alloy sputtering
	L. P. Zheng; R. S. Li; S. Y. Li
	1997
发表期刊	Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films
ISSN	0734-2101
卷号	15 期号:4 页码:2431-2433
摘要	Under simulated 1 keV Ar ion bombardment at low temperatures, the angular distributions of the steady sputter state of Cu-Ni alloys have been studied with the help of a dynamic Monte Carlo program. Calculations show the preferential emission of Ni in the near-normal direction, but that of Cu at oblique angles. Calculations also show that these preferential emissions strongly depend on the bulk composition. (C) 1997 American Vacuum Society.
部门归属	acad sinica,inst met res,atom imaging solids lab,shenyang 110015,peoples r china. acad sinica,int ctr mat phys,shenyang 110015,peoples r china.;zheng, lp (reprint author), acad sinica,shanghai inst nucl res,pob 800-204,shanghai 201800,peoples r china
关键词	Surface-composition Changes Ar ion-bombArdment Gibbsian Segregation Ni Alloys Elements Implantation Temperature Depth
URL	查看原文
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/38227
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	L. P. Zheng,R. S. Li,S. Y. Li. On the relation between preferential emission and bulk composition in binary alloy sputtering[J]. Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films,1997,15(4):2431-2433.
APA	L. P. Zheng,R. S. Li,&S. Y. Li.(1997).On the relation between preferential emission and bulk composition in binary alloy sputtering.Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films,15(4),2431-2433.
MLA	L. P. Zheng,et al."On the relation between preferential emission and bulk composition in binary alloy sputtering".Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films 15.4(1997):2431-2433.