The effect of electron effective mass mismatch on the electron-optical-phonon scattering rate in a quantum well structure | |
Y. S. Zheng; T. Q. Lu; J. Liu; W. H. Su | |
1997 | |
发表期刊 | Semiconductor Science and Technology
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ISSN | 0268-1242 |
卷号 | 12期号:10页码:1235-1239 |
摘要 | The effective mass mismatch of a conduction-band electron in a semiconductor quantum well structure brings about a novel confinement of the electron movement along the well-growth direction in addition to the conduction-band offset. Using the electron-optical-phonon interaction Hamiltonian of the dielectric continuum model, we calculate the scattering rates due to the interaction of the electron with the well, barrier and interface phonons respectively. By comparison with the corresponding results for the case without the electron effective mass mismatch it is shown that the electron effective mass mismatch has a remarkable influence on the scattering rate, especially for relatively high electron energy, and much attention should be paid to it. |
部门归属 | china ctr adv sci & technol,world lab,ctr condensed matter & radiat phys,beijing 100080,peoples r china. acad sinica,int ctr mat phys,shenyang 110015,peoples r china.;zheng, ys (reprint author), jilin univ,dept phys,grp solid state phys,changchun 130023,peoples r china |
关键词 | Semiconductor Gaas |
URL | 查看原文 |
文献类型 | 期刊论文 |
条目标识符 | http://ir.imr.ac.cn/handle/321006/38235 |
专题 | 中国科学院金属研究所 |
推荐引用方式 GB/T 7714 | Y. S. Zheng,T. Q. Lu,J. Liu,et al. The effect of electron effective mass mismatch on the electron-optical-phonon scattering rate in a quantum well structure[J]. Semiconductor Science and Technology,1997,12(10):1235-1239. |
APA | Y. S. Zheng,T. Q. Lu,J. Liu,&W. H. Su.(1997).The effect of electron effective mass mismatch on the electron-optical-phonon scattering rate in a quantum well structure.Semiconductor Science and Technology,12(10),1235-1239. |
MLA | Y. S. Zheng,et al."The effect of electron effective mass mismatch on the electron-optical-phonon scattering rate in a quantum well structure".Semiconductor Science and Technology 12.10(1997):1235-1239. |
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