COATING THICKNESS DETERMINATION BY CATHODIC SPUTTERING GLOW-DISCHARGE ATOMIC-ABSORPTION SPECTROMETRY (GDAAS)

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	COATING THICKNESS DETERMINATION BY CATHODIC SPUTTERING GLOW-DISCHARGE ATOMIC-ABSORPTION SPECTROMETRY (GDAAS)
	J. L. You; Z. S. Wang; G. S. Zhang; J. S. Ren
	1993
发表期刊	Analytical Letters
ISSN	0003-2719
卷号	26 期号:3 页码:541-556
摘要	A method of coating thickness determination using cathodic sputtering glow discharge as atomizer with atomic absorption spectrometry (GDAAS) is developed. By the relationship of absorbance A and the specific quantity of sputtering qc, Cu, Ni-P and Zn coating thickness determinations have been tested. Experiments show that if the relationship between A and qc has been established, no properly prepared standards are usually necessary. It is a generally suitable method for conducting samples. Precision < 2.6% and no systematic error has been found.
部门归属	acad sinica,inst met res,shenyang 110015,peoples r china.;you, jl (reprint author), shanghai univ technology,dept chem & chem engn,shanghai 200072,peoples r china
关键词	Coating Thickness Glow Discharge Cathodic Sputtering Atomic Absorption Spectrometry
URL	查看原文
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/39165
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	J. L. You,Z. S. Wang,G. S. Zhang,et al. COATING THICKNESS DETERMINATION BY CATHODIC SPUTTERING GLOW-DISCHARGE ATOMIC-ABSORPTION SPECTROMETRY (GDAAS)[J]. Analytical Letters,1993,26(3):541-556.
APA	J. L. You,Z. S. Wang,G. S. Zhang,&J. S. Ren.(1993).COATING THICKNESS DETERMINATION BY CATHODIC SPUTTERING GLOW-DISCHARGE ATOMIC-ABSORPTION SPECTROMETRY (GDAAS).Analytical Letters,26(3),541-556.
MLA	J. L. You,et al."COATING THICKNESS DETERMINATION BY CATHODIC SPUTTERING GLOW-DISCHARGE ATOMIC-ABSORPTION SPECTROMETRY (GDAAS)".Analytical Letters 26.3(1993):541-556.