EFFECT OF REVERSE-BIAS ANNEALING AND ZERO-BIAS ANNEALING ON A HYDROGEN-CONTAINING AU/(N-TYPE GAAS) SCHOTTKY-BARRIER

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	EFFECT OF REVERSE-BIAS ANNEALING AND ZERO-BIAS ANNEALING ON A HYDROGEN-CONTAINING AU/(N-TYPE GAAS) SCHOTTKY-BARRIER
	M. H. Yuan; H. Z. Song; S. X. Jin; H. P. Wang; Y. P. Qiao; G. G. Qin
	1993
发表期刊	Physical Review B
ISSN	0163-1829
卷号	48 期号:24 页码:17986-17994
摘要	After exposure to hydrogen plasma and chemical etching to remove layers of different thicknesses, n-type GaAs wafers with (100) and (110) orientation were deposited with Au to form Au/(n-GaAs) Schottky barriers (SB's). After zero-bias annealing (ZBA), the Schottky barrier height (SBH) of the Au/(n-GaAs) SB's containing hydrogen falls; after reverse-bias annealing (RBA), the SBH rises; and the SBH is reversible within experimental precision in at least three ZBA-RBA processes. Furthermore, the control effect of zero-bias annealing and reverse-bias annealing on the Schottky barrier height depends quantitatively on the orientation of the GaAs wafer and the thickness of the layer removed by chemical etching before deposition of Au. But the Schottky-barrier height of a control Schottky-barrier that is not subject to hydrogen exposure changes little during zero-bias annealing or reverse-bias annealing processes. It is also found that besides the SBH the effective Richardson coefficient of the SB containing hydrogen has a one-to-one correlation with the reverse bias of the RBA (100 degrees C, 2 h). Experiments strongly support the fact that the hydrogen contained in the SB is essential for the above ZBA-RBA effect. We have suggested a physical model to explain why hydrogen can reduce the Schottky-barrier heights and result in the ZBA-RBA effect of Au/(n-GaAs) Schottky barriers.
部门归属	acad sinica, int ctr mat phys, shenyang 110015, peoples r china.;yuan, mh (reprint author), beijing univ, dept phys, beijing 100871, peoples r china
关键词	Metal-semiconductor Interfaces Electrical-properties 110 Surfaces N-type States Diodes Contacts Height Model Heterojunctions
URL	查看原文
WOS记录号	WOS:A1993MQ16500038
引用统计	被引频次：2[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/39168
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	M. H. Yuan,H. Z. Song,S. X. Jin,et al. EFFECT OF REVERSE-BIAS ANNEALING AND ZERO-BIAS ANNEALING ON A HYDROGEN-CONTAINING AU/(N-TYPE GAAS) SCHOTTKY-BARRIER[J]. Physical Review B,1993,48(24):17986-17994.
APA	M. H. Yuan,H. Z. Song,S. X. Jin,H. P. Wang,Y. P. Qiao,&G. G. Qin.(1993).EFFECT OF REVERSE-BIAS ANNEALING AND ZERO-BIAS ANNEALING ON A HYDROGEN-CONTAINING AU/(N-TYPE GAAS) SCHOTTKY-BARRIER.Physical Review B,48(24),17986-17994.
MLA	M. H. Yuan,et al."EFFECT OF REVERSE-BIAS ANNEALING AND ZERO-BIAS ANNEALING ON A HYDROGEN-CONTAINING AU/(N-TYPE GAAS) SCHOTTKY-BARRIER".Physical Review B 48.24(1993):17986-17994.