MICROSTRUCTURAL AND INDENTATION CHARACTERIZATION OF TI/TIN MULTILAYER FILMS

IMR OpenIR

	MICROSTRUCTURAL AND INDENTATION CHARACTERIZATION OF TI/TIN MULTILAYER FILMS
	R. F. Huang; L. S. Wen; L. P. Guo; J. Gong; B. H. Yu; H. Bangert
	1992
发表期刊	Surface & Coatings Technology
ISSN	0257-8972
卷号	50 期号:2 页码:97-101
摘要	The microstructure of Ti/Tin multilayer films deposited by hollow cathode discharge ion plating, was studied using transmission electron microscopy and mu-mu-diffraction in combination with X-ray diffraction. The Ti/TiN multilayer films consisted of hexagonal alpha-Ti, tetragonal epsilon-Ti2N and cubic delta-TiN. They had a clearly layered structure of Ti/Ti2N/TiN/Ti2N/Ti..., with single layer thicknesses of titanium and TiN ranging from several to several hundred nanometers. Interfacial chemical reactions during deposition produced a Ti2N transition layer between every adjacent pair of titanium and TiN layers. A transition layer of FeTi between the film and the substrate was observed, which resulted in good adhesion between the film and the substrate. Ti/TiN multilayer films had fibrous crystallites. A refining of the grain size of multilayer films was discovered which could be correlated with the indentation behavior of the multilayer films.
部门归属	vienna tech univ,a-1040 vienna,austria.;huang, rf (reprint author), acad sinica,inst met res,shenyang 110015,peoples r china
URL	查看原文
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/39231
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	R. F. Huang,L. S. Wen,L. P. Guo,et al. MICROSTRUCTURAL AND INDENTATION CHARACTERIZATION OF TI/TIN MULTILAYER FILMS[J]. Surface & Coatings Technology,1992,50(2):97-101.
APA	R. F. Huang,L. S. Wen,L. P. Guo,J. Gong,B. H. Yu,&H. Bangert.(1992).MICROSTRUCTURAL AND INDENTATION CHARACTERIZATION OF TI/TIN MULTILAYER FILMS.Surface & Coatings Technology,50(2),97-101.
MLA	R. F. Huang,et al."MICROSTRUCTURAL AND INDENTATION CHARACTERIZATION OF TI/TIN MULTILAYER FILMS".Surface & Coatings Technology 50.2(1992):97-101.