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ELECTRONIC-STRUCTURE AND MAGNETISM OF FE-GE INTERFACES
D. C. Tian; Q. Jiang
1992
发表期刊Journal of Physics-Condensed Matter
ISSN0953-8984
卷号4期号:3页码:799-808
摘要The local electronic density of states (LDOS) has been calculated for Fe-Ge(110), Fe-Ge(111) and Fe-Ge(100) interfaces and neighbouring atomic planes using the recursion method. Interface states are found to exist within the mutual gaps of the constituent atoms and strongly depending on the local atomic environments. The most excess LDOSS are found for Fe-Ge(111) interface and the least for Fe-Ge(110). The magnetic moments for Fe atoms are found to decrease when the Fe layer approaches the interface boundary, which is in accord with the experiments. The electron spin polarization parameters evaluated from the LDOS are qualitatively consistent with experimental measurements.
部门归属acad sinica,int ctr mat phys,shenyang,peoples r china.;tian, dc (reprint author), wuhan univ,dept phys,wuhan,peoples r china
关键词Spin Polarization Surface Magnetization Recursion Method States Iron Films Ni
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文献类型期刊论文
条目标识符http://ir.imr.ac.cn/handle/321006/39295
专题中国科学院金属研究所
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GB/T 7714
D. C. Tian,Q. Jiang. ELECTRONIC-STRUCTURE AND MAGNETISM OF FE-GE INTERFACES[J]. Journal of Physics-Condensed Matter,1992,4(3):799-808.
APA D. C. Tian,&Q. Jiang.(1992).ELECTRONIC-STRUCTURE AND MAGNETISM OF FE-GE INTERFACES.Journal of Physics-Condensed Matter,4(3),799-808.
MLA D. C. Tian,et al."ELECTRONIC-STRUCTURE AND MAGNETISM OF FE-GE INTERFACES".Journal of Physics-Condensed Matter 4.3(1992):799-808.
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