A TRANSMISSION ELECTRON-MICROSCOPY STUDY ON TI-N FILMS DEPOSITED BY ION PLATING

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	A TRANSMISSION ELECTRON-MICROSCOPY STUDY ON TI-N FILMS DEPOSITED BY ION PLATING
	L. S. Wen; X. Jiang; C. Y. Si
	1986
发表期刊	Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films
ISSN	0734-2101
卷号	4 期号:6 页码:2682-2685
部门归属	wen, ls (reprint author), acad sinica,inst met res,shenyang,peoples r china
URL	查看原文
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/39904
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	L. S. Wen,X. Jiang,C. Y. Si. A TRANSMISSION ELECTRON-MICROSCOPY STUDY ON TI-N FILMS DEPOSITED BY ION PLATING[J]. Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films,1986,4(6):2682-2685.
APA	L. S. Wen,X. Jiang,&C. Y. Si.(1986).A TRANSMISSION ELECTRON-MICROSCOPY STUDY ON TI-N FILMS DEPOSITED BY ION PLATING.Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films,4(6),2682-2685.
MLA	L. S. Wen,et al."A TRANSMISSION ELECTRON-MICROSCOPY STUDY ON TI-N FILMS DEPOSITED BY ION PLATING".Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films 4.6(1986):2682-2685.