In situ scanning-tunneling-microscope observation on dissolution of a Cu-20Zr film

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	In situ scanning-tunneling-microscope observation on dissolution of a Cu-20Zr film
	H. B. Lu; G. Z. Meng; Y. Li; F. H. Wang
	2005
发表期刊	Journal of Materials Science & Technology
ISSN	1005-0302
卷号	21 期号:3 页码:311-314
摘要	A nanocrystalline coating of Cu-20Zr (in wt pct) was obtained on glass by magnetron sputtering. The corrosion behavior of the Cu-20Zr film in 0.001 mol/L HCI solution was investigated using potentiodynamic polarization and in situ electrochemical scanning-tunneling-microscopy (ECSTM). Results demonstrated that the film exhibits active behavior. Microscopic pitting corrosion and tunneling are caused by localized electrodissolution of Zr atoms and the diffusion of Cu atoms at surface defects.
部门归属	chinese acad sci, met res inst, state key lab corros & protect, shenyang 110016, peoples r china.;li, y (reprint author), chinese acad sci, met res inst, state key lab corros & protect, shenyang 110016, peoples r china;liying@imr.ac.cn
关键词	Magnetron Sputtering Film Potentiodynamic Polarization Ecstm Electrochemical Stm Noble-metal Alloys Copper Corrosion Cu(111)
URL	查看原文
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/40020
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	H. B. Lu,G. Z. Meng,Y. Li,et al. In situ scanning-tunneling-microscope observation on dissolution of a Cu-20Zr film[J]. Journal of Materials Science & Technology,2005,21(3):311-314.
APA	H. B. Lu,G. Z. Meng,Y. Li,&F. H. Wang.(2005).In situ scanning-tunneling-microscope observation on dissolution of a Cu-20Zr film.Journal of Materials Science & Technology,21(3),311-314.
MLA	H. B. Lu,et al."In situ scanning-tunneling-microscope observation on dissolution of a Cu-20Zr film".Journal of Materials Science & Technology 21.3(2005):311-314.