Influence of an External Magnetic Field on the Growth of Nanocrystalline Silicon Films Grown by MF Magnetron Sputtering

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	Influence of an External Magnetic Field on the Growth of Nanocrystalline Silicon Films Grown by MF Magnetron Sputtering
	J. H. Gao; L. Zhang; J. Q. Xiao; J. Gong; C. Sun; L. S. Wen
	2012
发表期刊	Journal of Materials Science & Technology
ISSN	1005-0302
卷号	28 期号:11 页码:992-998
摘要	The effects of an external magnetic field originating from two solenoid coils on the magnetic field configuration, plasma state of a dual unbalanced magnetron sputter system and the structure of nanocrystalline Si films were examined. Numerical simulations of the magnetic field configuration showed that increasing the coil current significantly changed the magnetic field distribution between the substrate and targets. The saturated ion current density J(i) in the substrate position measured by using a circular flat probe increased from 0.18 to 0.55 mA/cm(2) with the coil current ranging from 0 to 6 A. X-ray diffraction and Raman results revealed that increasing the ion density near the substrate would benefit crystallization of films and the preferential growth along [111] orientation. From analysis of the surface morphology and the microstructure of Si films grown under different plasma conditions, it is found that with increasing the J(i), the surface of the film was smoothed and the alteration in the surface roughness was mainly correlated to the localized surface diffusion of the deposited species and the crystallization behavior of the films.
部门归属	[gao, junhua; zhang, lin; xiao, jinquan; gong, jun; sun, chao; wen, lishi] chinese acad sci, inst met res, state key lab corros & protect, shenyang 110016, peoples r china.;sun, c (reprint author), chinese acad sci, inst met res, state key lab corros & protect, shenyang 110016, peoples r china.;csun@imr.ac.cn
关键词	Nanocrystalline Silicon Thin Film Solenoid Coil Mf Magnetron Sputtering Chemical-vapor-deposition Amorphous-silicon Thin-films Microstructure Temperature Fabrication Density Si
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文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/59956
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	J. H. Gao,L. Zhang,J. Q. Xiao,et al. Influence of an External Magnetic Field on the Growth of Nanocrystalline Silicon Films Grown by MF Magnetron Sputtering[J]. Journal of Materials Science & Technology,2012,28(11):992-998.
APA	J. H. Gao,L. Zhang,J. Q. Xiao,J. Gong,C. Sun,&L. S. Wen.(2012).Influence of an External Magnetic Field on the Growth of Nanocrystalline Silicon Films Grown by MF Magnetron Sputtering.Journal of Materials Science & Technology,28(11),992-998.
MLA	J. H. Gao,et al."Influence of an External Magnetic Field on the Growth of Nanocrystalline Silicon Films Grown by MF Magnetron Sputtering".Journal of Materials Science & Technology 28.11(2012):992-998.