Progress of graphene growth on copper by chemical vapor deposition: Growth behavior and controlled synthesis | |
L. P. Ma; W. C. Ren; Z. L. Dong; L. Q. Liu; H. M. Cheng | |
2012 | |
发表期刊 | Chinese Science Bulletin
![]() |
ISSN | 1001-6538 |
卷号 | 57期号:23页码:2995-2999 |
摘要 | Recently, chemical vapor deposition (CVD) on copper has been becoming a main method for preparing large-area and high- quality monolayer graphene. In this paper, we first briefly introduce the preliminary understanding of the microstructure and growth behavior of graphene on copper, and then focus on the recent progress on the quality improvement, number of layers control and transfer-free growth of graphene. In the end, we attempt to analyze the possible development of CVD growth of graphene in future, including the controlled growth of large-size single-crystal graphene and bilayer graphene with different stacking orders. |
部门归属 | [ma laipeng; ren wencai; cheng huiming] chinese acad sci, inst met res, shenyang natl lab mat sci, shenyang 110016, peoples r china. [dong zaili; liu lianqing] chinese acad sci, shenyang inst automat, state key lab robot, shenyang 110016, peoples r china.;ma, lp (reprint author), chinese acad sci, inst met res, shenyang natl lab mat sci, shenyang 110016, peoples r china.;lpma@imr.ac.cn; wcren@imr.ac.cn |
关键词 | Graphene Controlled Growth Chemical Vapor Deposition Copper Substrate Bilayer Graphene Layer Graphene Films Cu(111) Foils |
URL | 查看原文 |
文献类型 | 期刊论文 |
条目标识符 | http://ir.imr.ac.cn/handle/321006/60153 |
专题 | 中国科学院金属研究所 |
推荐引用方式 GB/T 7714 | L. P. Ma,W. C. Ren,Z. L. Dong,et al. Progress of graphene growth on copper by chemical vapor deposition: Growth behavior and controlled synthesis[J]. Chinese Science Bulletin,2012,57(23):2995-2999. |
APA | L. P. Ma,W. C. Ren,Z. L. Dong,L. Q. Liu,&H. M. Cheng.(2012).Progress of graphene growth on copper by chemical vapor deposition: Growth behavior and controlled synthesis.Chinese Science Bulletin,57(23),2995-2999. |
MLA | L. P. Ma,et al."Progress of graphene growth on copper by chemical vapor deposition: Growth behavior and controlled synthesis".Chinese Science Bulletin 57.23(2012):2995-2999. |
条目包含的文件 | 条目无相关文件。 |
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。
修改评论