Study on nanocrystalline Cr2O3 films deposited by arc ion plating: I. composition, morphology, and microstructure analysis

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	Study on nanocrystalline Cr2O3 films deposited by arc ion plating: I. composition, morphology, and microstructure analysis
	T. G. Wang; D. Jeong; S. H. Kim; Q. Wang; D. W. Shin; S. Melin; S. Iyengar; K. H. Kim
	2012
发表期刊	Surface & Coatings Technology
ISSN	0257-8972
卷号	206 期号:10 页码:2629-2637
摘要	Nanocrystalline Cr2O3 thin films were deposited on silicon wafers with (100) orientation by arc ion plating (AIP) technique at various negative bias voltages. By virtue of X-ray diffraction analysis, scanning electron microscope, and high-resolution transmission electron microscope, the influence of substrate bias voltage on the film growth process, microstructure, and characteristics was investigated systematically, including the phase constituents, grain size, lattice constant, chemical compositions, as well as surface and cross-section morphologies. With increasing the bias voltage, the grain size and lattice constant of AIP Cr2O3 films first decreased slightly, and then increased gradually again. Both reached the minimum (35 nm and 13.57 angstrom) when the bias voltage was - 100 V. However, the bias voltage had little effect on the phase constituents and chemical compositions of AIP Cr2O3 films. During the film growth process, the surfaces of Cr2O3 films were getting smoother with the negative bias voltage increase, in the meantime, their microstructures evolved from coarse columnar grains to fine columnar grains, short columnar recrystallized grains, and fine columnar grains again. (C) 2011 Elsevier B.V. All rights reserved.
部门归属	[wang, tie-gang; jeong, dawoon; wang, qimin; kim, kwang ho] pusan natl univ, natl core res ctr hybrid mat solut, pusan 609735, south korea. [wang, tie-gang; melin, solveig; iyengar, srinivasan] lund univ, div mat engn, se-22100 lund, sweden. [wang, tie-gang] chinese acad sci, inst met res, state key lab corros & protect, shenyang 110016, peoples r china. [kim, soo-hyun] mech mat & parts ctr, pusan 618230, south korea. [wang, qimin] guangdong univ technol, sch mech & elect engn, guangzhou 510006, guangdong, peoples r china. [shin, dong-woo] gyeongsang natl univ, sch nano & adv mat engn, gyeongnam 660701, south korea.;wang, q (reprint author), pusan natl univ, natl core res ctr hybrid mat solut, pusan 609735, south korea.;qmwang@pusan.ac.kr; kwhokim@pusan.ac.kr
关键词	Cr2o3 Film Arc Ion Plating Bias Voltage Grain Size Surface Morphology Hrtem Chromium-oxide Coatings Pulsed-laser Deposition Negative Bias Voltage Si-n Coatings Thin-films Mechanical-properties Optical-properties Nitrogen Pressure Vapor-deposition Residual-stress
URL	查看原文
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/60305
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	T. G. Wang,D. Jeong,S. H. Kim,et al. Study on nanocrystalline Cr2O3 films deposited by arc ion plating: I. composition, morphology, and microstructure analysis[J]. Surface & Coatings Technology,2012,206(10):2629-2637.
APA	T. G. Wang.,D. Jeong.,S. H. Kim.,Q. Wang.,D. W. Shin.,...&K. H. Kim.(2012).Study on nanocrystalline Cr2O3 films deposited by arc ion plating: I. composition, morphology, and microstructure analysis.Surface & Coatings Technology,206(10),2629-2637.
MLA	T. G. Wang,et al."Study on nanocrystalline Cr2O3 films deposited by arc ion plating: I. composition, morphology, and microstructure analysis".Surface & Coatings Technology 206.10(2012):2629-2637.