Formation of Ti2AlN phase after post-heat treatment of Ti-Al-N films deposited by pulsed magnetron sputtering

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	Formation of Ti2AlN phase after post-heat treatment of Ti-Al-N films deposited by pulsed magnetron sputtering
	Y. Yang; M. Keunecke; C. Stein; L. J. Gao; J. Gong; X. Jiang; K. Bewilogua; C. Sun
	2012
发表期刊	Surface & Coatings Technology
ISSN	0257-8972
卷号	206 期号:10 页码:2661-2666
摘要	Ti-Al-N films with different compositions were prepared by varying the nitrogen flow rate using pulsed magnetron sputtering and subsequently annealed in air at 700 degrees C. The microstructure and microhardness of the films were investigated before and after heat treatment. The XRD results indicate that no Ti2AlN MAX phase occurs in all the as-deposited films. Ti2AlN phases could be acquired only after annealing via solid state reaction. The formation condition of Ti2AlN phase is strongly dependent on the film composition. It has been found that the nitrogen concentration in the films plays a key role for the phase formation, and the critical value is in the range of 22.5-29.6 at.%. The fractured cross-section SEM images show that all the as-deposited films exhibit a fine columnar morphology. The annealed films with Ti2AlN phase components change the morphology from columnar to fine equiaxed polycrystalline. In addition, the microhardness of the films containing Ti2AlN phase is also explored, which is within the range of 18-24 GPa. (C) 2011 Elsevier B.V. All rights reserved.
部门归属	[yang, ying; gao, li-jun; gong, jun; sun, chao] chinese acad sci, inst met res, state key lab corros & protect, shenyang 110016, peoples r china. [yang, ying; keunecke, martin; stein, christian; bewilogua, klaus] fraunhofer inst schicht & oberflachentech, d-38108 braunschweig, germany. [jiang, xin] univ siegen, inst mat engn, d-57076 siegen, germany.;sun, c (reprint author), chinese acad sci, inst met res, state key lab corros & protect, shenyang 110016, peoples r china.;csun@imr.ac.cn
关键词	Magnetron Sputtering Heat Treatment Microstructure Ti2aln Phase Ti-al-n Films Thin-films m(n+1)Ax(n) Phases Corrosion Ti3sic2 Growth Cr2alc
URL	查看原文
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/60400
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	Y. Yang,M. Keunecke,C. Stein,et al. Formation of Ti2AlN phase after post-heat treatment of Ti-Al-N films deposited by pulsed magnetron sputtering[J]. Surface & Coatings Technology,2012,206(10):2661-2666.
APA	Y. Yang.,M. Keunecke.,C. Stein.,L. J. Gao.,J. Gong.,...&C. Sun.(2012).Formation of Ti2AlN phase after post-heat treatment of Ti-Al-N films deposited by pulsed magnetron sputtering.Surface & Coatings Technology,206(10),2661-2666.
MLA	Y. Yang,et al."Formation of Ti2AlN phase after post-heat treatment of Ti-Al-N films deposited by pulsed magnetron sputtering".Surface & Coatings Technology 206.10(2012):2661-2666.