Deposition, microstructure and hardness of TiN/(Ti,Al)N multilayer films

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	Deposition, microstructure and hardness of TiN/(Ti,Al)N multilayer films
	Y. H. Zhao; L. Hu; G. Q. Lin; J. Q. Xiao; C. Dong; B. H. Yu
	2012
发表期刊	International Journal of Refractory Metals & Hard Materials
ISSN	0263-4368
卷号	32 页码:27-32
摘要	In this work, TiN/(Ti,Al)N multilayer films were deposited on stainless steel substrates with alternatively switching Ti and TiAl alloy targets sources on and off by pulse biased arc ion plating. The crystallography structures and cross-sectional structures of TiN/(Ti,Al)N multilayer films were evaluated by X-ray diffraction analysis (XRD) and by TEM, respectively. The hardness and film/substrate adhesion were determined by nanoindentation and scratch test, respectively. A complex set of microstructures has been found between TiN and (Ti,AI)N layers, at the interface, another layered interfacial region which consists of extremely fine sub-layers, which results from the rotation of the specimen in the deposition chamber. The hardness values of the multilayers exhibit higher hardness compared with that of monolithic (Ti,Al)N film. Crown Copyright (C) 2012 Published by Elsevier Ltd. All rights reserved.
部门归属	[zhao, y. h.; xiao, j. q.; yu, b. h.] chinese acad sci, inst met res, shenyang 110016, peoples r china. [hu, l.; lin, g. q.; dong, c.] dalian univ technol, key lab mat modificat laser ion & electron beams, minist educ, dalian 116024, peoples r china.;zhao, yh (reprint author), chinese acad sci, inst met res, shenyang 110016, peoples r china.;yhzhao@imr.ac.cn
关键词	Pulse Biased Arc Ion Plating Tin/(Ti Al)n Multilayer Films Tem Hardness Mechanical-properties Thin-films Superlattice Films Coatings Tin Stress Growth Performance Transition Monolayer
URL	查看原文
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/60491
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	Y. H. Zhao,L. Hu,G. Q. Lin,et al. Deposition, microstructure and hardness of TiN/(Ti,Al)N multilayer films[J]. International Journal of Refractory Metals & Hard Materials,2012,32:27-32.
APA	Y. H. Zhao,L. Hu,G. Q. Lin,J. Q. Xiao,C. Dong,&B. H. Yu.(2012).Deposition, microstructure and hardness of TiN/(Ti,Al)N multilayer films.International Journal of Refractory Metals & Hard Materials,32,27-32.
MLA	Y. H. Zhao,et al."Deposition, microstructure and hardness of TiN/(Ti,Al)N multilayer films".International Journal of Refractory Metals & Hard Materials 32(2012):27-32.