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氮化铝薄膜发光性能的研究进展
佟洪波; 巴德纯; 肖金泉; 闻立时
2005-07-14
Conference Name2005全国真空冶金与表面工程学术会议
Source Publication2005'全国真空冶金与表面工程学术会议论文集
Conference Date2005-07-14
Conference Place沈阳
Abstract  本文介绍了AlN薄膜物理性质及制备方法;综述了AlN薄膜作为薄膜电致发光(TFEL)器件发光层的研究现状;对AlN薄膜的发光性能的应用前景做了展望。
description.department东北大学,辽宁,沈阳,110004;辽宁石油化工大学,辽宁,抚顺,113001;东北大学,辽宁,沈阳,110004;中国科学院金属研究所,辽宁,沈阳,110016;
Keyword薄膜 氮化铝 电致发光 发光性能
Funding Organization中国真空学会
Language中文
Document Type会议论文
Identifierhttp://ir.imr.ac.cn/handle/321006/70343
Collection中国科学院金属研究所
Recommended Citation
GB/T 7714
佟洪波,巴德纯,肖金泉,等. 氮化铝薄膜发光性能的研究进展[C],2005.
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