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题名: Preparation and Formation Mechanism of Highly Dispersed Manganese Silicide on Silica by MOCVD of Mn(CO)(5)SiCl3
作者: J. C. Guan;  J. H. Jin;  X. Chen;  B. S. Zhang;  D. S. Su;  C. H. Liang
发表日期: 2013
刊名: Chemical Vapor Deposition
相关网址: <Go to ISI>://WOS:000316288300011
Appears in Collections:中国科学院金属研究所_期刊论文

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Recommended Citation:
J. C. Guan,J. H. Jin,X. Chen,et al. Preparation And Formation Mechanism Of Highly Dispersed Manganese Silicide On Silica By Mocvd Of Mn(co)(5)sicl3[J]. Chemical Vapor Deposition,2013,19(1-3):68-73.

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