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High Performance Ultra-Thin Niobium Films for Superconducting Hot-Electron Devices
X. Q. Jia; L. Kang; X. Y. Liu; Z. H. Wang; B. B. Jin; S. B. Mi; J. Chen; W. W. Xu; P. H. Wu
2013
Source PublicationIeee Transactions on Applied Superconductivity
ISSN1051-8223
Volume23Issue:3
AbstractHigh-quality ultrathin film is the key element of hot-electron devices. Using a doped sputtering target, high-performance niobium (Nb) ultrathin films are grown on high-resistivity silicon (Si), magnesium oxide (MgO), and sapphire substrates, optimized by grown 1-nm-thick aluminum nitride (AlN) films on the top. Superconducting transition temperature (T-C) of about 7.5 K and critical current density (J(C)) of about 8.2 x 10(6) A/cm(2) at 4.2 K have been obtained for the Nb film of 6.5 nm thickness on MgO substrates. The results of the films' structural characterization by X-ray photo electronic spectroscopy, atomic force microscopy, transmission electron microscopy, and X-ray diffraction are also presented.
description.department[jia, x. q. ; kang, l. ; jin, b. b. ; chen, j. ; xu, w. w. ; wu, p. h.] nanjing univ, rise, jiangsu key lab adv manipulat technol electromagn, sch elect sci & engn, nanjing 210093, jiangsu, peoples r china. [liu, x. y.] nanjing univ, nanjing 210093, jiangsu, peoples r china. [wang, z. h.] nanjing univ, sch phys, nanjing 210093, jiangsu, peoples r china. [mi, s. b.] chinese acad sci, shenyang natl lab mat sci, inst met res, shenyang 110016, peoples r china. ; jia, xq (reprint author), nanjing univ, rise, jiangsu key lab adv manipulat technol electromagn, sch elect sci & engn, nanjing 210093, jiangsu, peoples r china. ; xqjia@nju.edu.cn ; kanglin@nju.edu.cn ; xyliu@163.com ; zhwang@nju.edu.cn ; bbjin@nju.edu.cn ; chenj63@nju.edu.cn ; wwxu@nju.edu.cn ; phwu@nju.educn
KeywordHigh Critical Current Density (j(c)) Magnetron Sputtering Niobium Superconducting Ultra-thin Film Nb Surfaces Arrays Xps Oxides
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Language英语
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/71278
Collection中国科学院金属研究所
Recommended Citation
GB/T 7714
X. Q. Jia,L. Kang,X. Y. Liu,et al. High Performance Ultra-Thin Niobium Films for Superconducting Hot-Electron Devices[J]. Ieee Transactions on Applied Superconductivity,2013,23(3).
APA X. Q. Jia.,L. Kang.,X. Y. Liu.,Z. H. Wang.,B. B. Jin.,...&P. H. Wu.(2013).High Performance Ultra-Thin Niobium Films for Superconducting Hot-Electron Devices.Ieee Transactions on Applied Superconductivity,23(3).
MLA X. Q. Jia,et al."High Performance Ultra-Thin Niobium Films for Superconducting Hot-Electron Devices".Ieee Transactions on Applied Superconductivity 23.3(2013).
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