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Comparative studies on damages to organic layer during the deposition of ITO films by various sputtering methods
H. Lei; M. H. Wang; Y. Hoshi; T. Uchida; S. Kobayashi; Y. Sawada
2013
Source PublicationApplied Surface Science
ISSN0169-4332
Volume285Pages:389-394
AbstractAluminum (III) bis(2-methyl-8-quninolinato)-4-phenylphenolate (BAlq) was respectively bombarded and irradiated by Ar ions, oxygen ions, electron beam and ultraviolet light to confirm damages during the sputter-deposition of transparent conductive oxide (TCO) on organic layer. The degree of damage was evaluated by the photoluminescence (PL) spectra of BAlq. The results confirmed the oxygen ions led to a larger damage and were thought to play the double roles of bombardment to organic layer and reaction with organic layer as well. The comparative studies on PL spectra of BAlq after the deposition of TCO films by various sputtering systems, such as conventional magnetron sputtering (MS), low voltage sputtering (LVS) and kinetic-energy-control-deposition (KECD) system, facing target sputtering (FT S) were performed. Relative to MS, LVS and KECD system, FTS can completely suppress the bombardment of the secondary electrons and oxygen negative ions, and keep a higher deposition rate simultaneously, thus it is a good solution to attain a low-damage sputter-deposition. (C) 2013 Elsevier B.V. All rights reserved.
description.department[lei, hao] chinese acad sci, sate key lab corros & protect, div surface engn mat, inst met res, shenyang 110016, peoples r china. [wang, meihan] shenyang univ, coll mech engn, shenyang 110044, peoples r china. [hoshi, yoichi ; uchida, takayuki ; kobayashi, shinichi ; sawada, yutaka] tokyo polytech univ, ctr hyper media res, atsugi, kanagawa 2430297, japan. ; lei, h (reprint author), chinese acad sci, sate key lab corros & protect, div surface engn mat, inst met res, shenyang 110016, peoples r china. ; haolei@imr.ac.cn
KeywordDamage To Organic Layer Magnetron Sputtering (Ms) Low Voltage Sputtering (Lvs) Kinetic-energy-control-deposition (Kecd) Facing Target Sputtering (Fts) Pl Spectra Thin-films Tris-(8-hydroxyquinoline) Aluminum Bombardment
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Language英语
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/71301
Collection中国科学院金属研究所
Recommended Citation
GB/T 7714
H. Lei,M. H. Wang,Y. Hoshi,et al. Comparative studies on damages to organic layer during the deposition of ITO films by various sputtering methods[J]. Applied Surface Science,2013,285:389-394.
APA H. Lei,M. H. Wang,Y. Hoshi,T. Uchida,S. Kobayashi,&Y. Sawada.(2013).Comparative studies on damages to organic layer during the deposition of ITO films by various sputtering methods.Applied Surface Science,285,389-394.
MLA H. Lei,et al."Comparative studies on damages to organic layer during the deposition of ITO films by various sputtering methods".Applied Surface Science 285(2013):389-394.
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