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题名: Thermal crystallization kinetic and electrical properties of partly crystallized amorphous indium oxide thin films sputtering deposited in the presence or the absence of water vapor
作者: M. H. Wang;  H. Lei;  Y. Seki;  S. Seki;  Y. Sawada;  Y. Hoshi;  S. H. Wang;  L. X. Sun
发表日期: 2013
刊名: Journal of Thermal Analysis and Calorimetry
相关网址: <Go to ISI>://WOS:000313409700058
Appears in Collections:中国科学院金属研究所_期刊论文

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Recommended Citation:
M. H. Wang,H. Lei,Y. Seki,et al. Thermal Crystallization Kinetic And Electrical Properties Of Partly Crystallized Amorphous Indium Oxide Thin Films Sputtering Deposited In The Presence Or The Absence Of Water Vapor[J]. Journal Of Thermal Analysis And Calorimetry,2013,111(2):1457-1461.

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