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题名: High-temperature thermal stability of nanocrystalline Cr2O3 films deposited on silicon wafers by arc ion plating
作者: T. G. Wang;  Y. M. Liu;  H. Sina;  C. M. Shi;  S. Iyengar;  S. Melin;  K. H. Kim
发表日期: 2013
刊名: Surface & Coatings Technology
相关网址: <Go to ISI>://WOS:000321797100016
Appears in Collections:中国科学院金属研究所_期刊论文

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Recommended Citation:
T. G. Wang,Y. M. Liu,H. Sina,et al. High-temperature Thermal Stability Of Nanocrystalline Cr2o3 Films Deposited On Silicon Wafers By Arc Ion Plating[J]. Surface & Coatings Technology,2013,228:140-147.

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