Microstructure and properties of AlB2-type WB2 thin films deposited by direct-current magnetron sputtering

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	Microstructure and properties of AlB2-type WB2 thin films deposited by direct-current magnetron sputtering
	Y. M. Liu; C. L. Jiang; Z. L. Pei; H. Lei; J. Gong; C. Sun
	2014
发表期刊	Surface & Coatings Technology
ISSN	0257-8972
卷号	245 页码:108-116
摘要	In this study, AlB2-type WB2 films are deposited on YG8 (WC-Co) substrates by DC magnetron sputtering at different substrate bias voltages and temperatures. Their effects on the film microstructure, elemental composition, mechanical and tribological properties are investigated systematically by various analysis methods, including X-ray diffraction (XRD), electron probe X-ray microanalyzer (EPMA), field emission scanning electron microscopy (FESEM), high resolution transmission electron microscopy (HRTEM), atomic force microscopy (AFM), nano-indentation, ball-on-disk tribometer and micro scratch tester. The as-deposited films show an under-stoichiometric composition with rich tungsten concentration and have an obvious columnar structure. With the substrate bias voltage increasing (from 0 V to - 150 V), the orientation of the films changes from (0 0 1) to (1 01). And films obtained at -50 V show superior mechanical and tribological properties. By increasing the substrate temperature to 500 degrees C, the maximum hardness about 40.5 GPa and the best adhesive strength of 60 N are detected. The films with the fine-grain amorphous structure, produced at 300 degrees C and -50 V, exhibit the minimum friction coefficient of 0.28. And the minimum wear rate of 2.3 x 10(-7) mm(3)/mN is obtained for the films deposited at 50 V and 400 degrees C. The properties described above are attributed to the variations of microstructure and morphologies in the films. Furthermore, the wear track and debris are also discussed by virtue of FESEM/EDS to explore the self-lubricating behavior of the AlB2-type WB2 film. (C) 2014 Elsevier B.V. All rights reserved.
部门归属	[liu, y. m. ; jiang, c. l. ; pei, z. l. ; lei, h. ; gong, j. ; sun, c.] chinese acad sci, inst met res, state key lab corros & protect, shenyang 110016, peoples r china. ; sun, c (reprint author), chinese acad sci, inst met res, state key lab corros & protect, 72 wenhua rd, shenyang 110016, peoples r china. ; csun@imr.ac.cn
关键词	Alb2-type Wb2 Films Dc Magnetron Sputtering Hardness Tribological Properties Self-lubricating Boric-acid Films Mechanical-properties Enhanced Resistance Oxide Coatings Hard Coatings Bias Voltage Tool Steel Al Substrate Tungsten
URL	查看原文
语种	英语
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/72884
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	Y. M. Liu,C. L. Jiang,Z. L. Pei,et al. Microstructure and properties of AlB2-type WB2 thin films deposited by direct-current magnetron sputtering[J]. Surface & Coatings Technology,2014,245:108-116.
APA	Y. M. Liu,C. L. Jiang,Z. L. Pei,H. Lei,J. Gong,&C. Sun.(2014).Microstructure and properties of AlB2-type WB2 thin films deposited by direct-current magnetron sputtering.Surface & Coatings Technology,245,108-116.
MLA	Y. M. Liu,et al."Microstructure and properties of AlB2-type WB2 thin films deposited by direct-current magnetron sputtering".Surface & Coatings Technology 245(2014):108-116.