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题名: Pressure induced metallization of SiH4(H-2)(2) via first-principles calculations
作者: Y. K. Wei;  N. N. Ge;  G. F. Ji;  X. R. Chen;  L. C. Cai;  D. Q. Wei
发表日期: 2014
刊名: Computational Materials Science
相关网址: <Go to ISI>://WOS:000335445400017
Appears in Collections:中国科学院金属研究所_期刊论文

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Recommended Citation:
Y. K. Wei,N. N. Ge,G. F. Ji,et al. Pressure Induced Metallization Of Sih4(h-2)(2) Via First-principles Calculations[J]. Computational Materials Science,2014,88:116-123.

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