IMR OpenIR
二次插层蒙脱土的制备及其对环氧涂层耐蚀性的影响
刘明明; 尹桂来; 刘福春; 唐囡; 韩恩厚; 万军彪; 邓静伟
2014-09-25
Source Publication材料研究学报
Issue9Pages:668-674
Abstract使用两步插层方法制备了插层蒙脱土,用红外光谱(IR)和X射线衍射(XRD)图谱对插层效果进行了表征。结果表明,十八烷基胺以及8-羟基喹啉已进入蒙脱土层间,蒙脱土层间距分别由1.17 nm增加到1.57 nm和1.82 nm。EIS结果显示插层蒙脱土显著提高了环氧涂层的耐蚀性。
description.department中国科学院金属研究所中国科学院核用结构材料与安全性评价重点实验室 ; 国网江西省电力科学研究院
Keyword有机高分子材料 蒙脱土 插层剂 防腐蚀涂料 输变电设备
Language中文
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/73571
Collection中国科学院金属研究所
Recommended Citation
GB/T 7714
刘明明,尹桂来,刘福春,等. 二次插层蒙脱土的制备及其对环氧涂层耐蚀性的影响[J]. 材料研究学报,2014(9):668-674.
APA 刘明明.,尹桂来.,刘福春.,唐囡.,韩恩厚.,...&邓静伟.(2014).二次插层蒙脱土的制备及其对环氧涂层耐蚀性的影响.材料研究学报(9),668-674.
MLA 刘明明,et al."二次插层蒙脱土的制备及其对环氧涂层耐蚀性的影响".材料研究学报 .9(2014):668-674.
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