Adsorption and Diffusion Behavior of Cl- on Sputtering Fe-20Cr Nanocrystalline Thin Film in Acid Solution (pH=2)

IMR OpenIR

	Adsorption and Diffusion Behavior of Cl- on Sputtering Fe-20Cr Nanocrystalline Thin Film in Acid Solution (pH=2)
	Zhang, Bin; Liu, Li; Li, Tianshu; Li, Ying; Lei, Mingkai; Wang, Fuhui; liliu@imr.ac.cn
	2015
发表期刊	JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY
ISSN	1005-0302
卷号	31 期号:12 页码:1198-1206
摘要	The adsorption and diffusion behavior of Cl- on sputtering Fe-20Cr nanocrystalline (NC) thin film compared with corresponding coarse crystalline (CC) alloy has been studied in HCl + NaCl solution (pH = 2, [Cl-]= 0.1 mol/L) by electrochemical techniques, X-ray photoelectron spectroscopy (XPS) and the first-principles calculations. The XPS results show that adsorption and diffusion of Cl- in the passive film has been inhibited on NC thin film. Ultra-violet photoelectron spectroscopy (UPS) results show that the work function Phi(s) of NC thin film (4.7 eV) is higher than that of CC alloy (4.5 eV). The theoretical calculations and valence electron structure analysis were used to understand the effect of nanocrystallization in this work. Copyright (C) 2015, The editorial office of Journal of Materials Science & Technology. Published by Elsevier Limited. All rights reserved.
部门归属	[zhang, bin ; lei, mingkai] dalian univ technol, dept mat sci & engn, surface engn lab, dalian 116023, peoples r china ; [zhang, bin ; liu, li ; li, tianshu ; li, ying ; wang, fuhui] chinese acad sci, inst met res, shenyang 110016, peoples r china
关键词	Nanocrystalline Cl- Adsorption Xps (X-ray Photoelectron Spectroscopy) First Principles Calculations
资助者	National Basic Research Program of China [2014CB643303]; National Natural Science Foundation of China [50801063, 51271187]
收录类别	sci
语种	英语
WOS记录号	WOS:000366158000007
引用统计	被引频次：7[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/74616
专题	中国科学院金属研究所
通讯作者	liliu@imr.ac.cn
推荐引用方式 GB/T 7714	Zhang, Bin,Liu, Li,Li, Tianshu,et al. Adsorption and Diffusion Behavior of Cl- on Sputtering Fe-20Cr Nanocrystalline Thin Film in Acid Solution (pH=2)[J]. JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY,2015,31(12):1198-1206.
APA	Zhang, Bin.,Liu, Li.,Li, Tianshu.,Li, Ying.,Lei, Mingkai.,...&liliu@imr.ac.cn.(2015).Adsorption and Diffusion Behavior of Cl- on Sputtering Fe-20Cr Nanocrystalline Thin Film in Acid Solution (pH=2).JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY,31(12),1198-1206.
MLA	Zhang, Bin,et al."Adsorption and Diffusion Behavior of Cl- on Sputtering Fe-20Cr Nanocrystalline Thin Film in Acid Solution (pH=2)".JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY 31.12(2015):1198-1206.