Effect of negative bias on the composition and structure of the tungsten oxide thin films deposited by magnetron sputtering

IMR OpenIR

	Effect of negative bias on the composition and structure of the tungsten oxide thin films deposited by magnetron sputtering
	Wang, Meihan; Lei, Hao; Wen, Jiaxing; Long, Haibo; Sawada, Yutaka; Hoshi, Yoichi; Uchida, Takayuki; Hou, Zhaoxia; haolei@imr.ac.cn
	2015
发表期刊	APPLIED SURFACE SCIENCE
ISSN	0169-4332
卷号	359 页码:521-525
摘要	Tungsten oxide thin films were deposited at room temperature under different negative bias voltages (V-b, 0 to -500V) by DC reactive magnetron sputtering, and then the as-deposited films were annealed at 500 degrees C in air atmosphere. The crystal structure, surface morphology, chemical composition and transmittance of the tungsten oxide thin films were characterized by X-ray diffraction (XRD), field emission scanning electron microscopy (FE-SEM), X-ray photoelectron spectroscopy (XPS) and UV-vis spectrophotometer. The XRD analysis reveals that the tungsten oxide films deposited at different negative bias voltages present a partly crystallized amorphous structure. All the films transfer from amorphous to crystalline (monoclinic + hexagonal) after annealing 3 h at 500 degrees C. Furthermore, the crystallized tungsten oxide films show different preferred orientation. The morphology of the tungsten oxide films deposited at different negative bias voltages is consisted of fine nanoscale grains. The grains grow up and conjunct with each other after annealing. The tungsten oxide films deposited at higher negative bias voltages after annealing show non-uniform special morphology. Substoichiometric tungsten oxide films were formed as evidenced by XPS spectra of W4f and O1s. As a result, semi-transparent films were obtained in the visible range for all films deposited at different negative bias voltages. (C) 2015 Elsevier B.V. All rights reserved.
部门归属	[wang, meihan ; wen, jiaxing ; long, haibo ; hou, zhaoxia] shenyang univ, sch mech engn, shenyang 110044, peoples r china ; [lei, hao] chinese acad sci, inst met res, surface engn mat div, shenyang 110016, peoples r china ; [sawada, yutaka ; hoshi, yoichi ; uchida, takayuki] tokyo polytechn univ, ctr hyper media res, atsugi, kanagawa 2430297, japan
关键词	Tungsten Oxide Thin Films Magnetron Sputtering Negative Bias Voltage (V-b) Structure Composition
资助者	National Natural Science Foundation of China [51302175]; Program for Liaoning Excellent Talents in University [LJQ2014132]; Technology Foundation for Selected Overseas Chinese Scholar; Ministry of Personnel of China; Natural Science Foundation of Liaoning Province of China [2013020132]
收录类别	sci
语种	英语
WOS记录号	WOS:000366220600071
引用统计	被引频次：2[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/74764
专题	中国科学院金属研究所
通讯作者	haolei@imr.ac.cn
推荐引用方式 GB/T 7714	Wang, Meihan,Lei, Hao,Wen, Jiaxing,et al. Effect of negative bias on the composition and structure of the tungsten oxide thin films deposited by magnetron sputtering[J]. APPLIED SURFACE SCIENCE,2015,359:521-525.
APA	Wang, Meihan.,Lei, Hao.,Wen, Jiaxing.,Long, Haibo.,Sawada, Yutaka.,...&haolei@imr.ac.cn.(2015).Effect of negative bias on the composition and structure of the tungsten oxide thin films deposited by magnetron sputtering.APPLIED SURFACE SCIENCE,359,521-525.
MLA	Wang, Meihan,et al."Effect of negative bias on the composition and structure of the tungsten oxide thin films deposited by magnetron sputtering".APPLIED SURFACE SCIENCE 359(2015):521-525.