Effect of Nitrogen Content on Microstructures and Mechanical Properties of WB2(N) Films Deposited by Reactive Magnetron Sputtering

IMR OpenIR

	Effect of Nitrogen Content on Microstructures and Mechanical Properties of WB2(N) Films Deposited by Reactive Magnetron Sputtering
	Liu, Y. M.; Deng, D. Y.; Lei, H.; Pei, Z. L.; Jiang, C. L.; Sun, C.; Gong, J.; jgong@imr.ac.cn
	2015
发表期刊	JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY
ISSN	1005-0302
卷号	31 期号:12 页码:1217-1225
摘要	In the present study, WB2(N) films are fabricated on silicon and YG8 substrates at different N-2 pressures by reactive magnetron sputtering. The influence of N-2 partial pressure (P-N2) on the film microstructure and characteristics is studied systematically, including the chemical composition, crystalline structure, residual stress, surface roughness as well as the surface and the cross-section morphology. Meanwhile, nano-indentation and ball-on-disk tribometer are performed to analyze the mechanical and tribological properties of the films. The results show that the addition of nitrogen apparently leads to the change of the structure from (1 0 1) to (0 0 1) orientation then to the amorphous structure with the formation of BN phase. And the addition of nitrogen can greatly refine the grain size and microstructure of the films. Furthermore, the residual stress of the film is also found to change from tensile to compressive stress as a function of P-N2, and the compressive stress increases with P-N2. The WB2(N) films with small nitrogen content, which are deposited at P-N2 of 0.004 and 0.006 Pa, exhibit better mechanical, tribological and corrosion properties than those of other films. Further increase of nitrogen content accelerates the formation of BN phase and fast decreases the film hardness. In addition, the large N-2 partial pressure gives rise to the target poisoning accompanied by the increase of the target voltage and the decrease of the deposition rate. Copyright (C) 2015, The editorial office of Journal of Materials Science & Technology. Published by Elsevier Limited. All rights reserved.
部门归属	[liu, y. m. ; deng, d. y. ; lei, h. ; pei, z. l. ; jiang, c. l. ; sun, c. ; gong, j.] chinese acad sci, inst met res, shenyang 110016, peoples r china
关键词	Reactive Magnetron Sputtering Nanocomposites Wb2(n) Films Residual Stress Mechanical Properties
资助者	National Key Basic Research Program of China (973 Program) [2012CB625100]; Natural Science Foundation of Liaoning Province of China [2013020093]
收录类别	sci
语种	英语
WOS记录号	WOS:000366158000009
引用统计	被引频次：11[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/74765
专题	中国科学院金属研究所
通讯作者	jgong@imr.ac.cn
推荐引用方式 GB/T 7714	Liu, Y. M.,Deng, D. Y.,Lei, H.,et al. Effect of Nitrogen Content on Microstructures and Mechanical Properties of WB2(N) Films Deposited by Reactive Magnetron Sputtering[J]. JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY,2015,31(12):1217-1225.
APA	Liu, Y. M..,Deng, D. Y..,Lei, H..,Pei, Z. L..,Jiang, C. L..,...&jgong@imr.ac.cn.(2015).Effect of Nitrogen Content on Microstructures and Mechanical Properties of WB2(N) Films Deposited by Reactive Magnetron Sputtering.JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY,31(12),1217-1225.
MLA	Liu, Y. M.,et al."Effect of Nitrogen Content on Microstructures and Mechanical Properties of WB2(N) Films Deposited by Reactive Magnetron Sputtering".JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY 31.12(2015):1217-1225.