Predicting multilayer film's residual stress from its monolayers

IMR OpenIR

	Predicting multilayer film's residual stress from its monolayers
	Guo, CQ; Pei, ZL; Fan, D; Liu, RD; Gong, J; Sun, C; Sun, C (reprint author), Chinese Acad Sci, Inst Met Res, Shenyang 110016, Peoples R China.
	2016-11-15
发表期刊	MATERIALS & DESIGN
ISSN	0264-1275
卷号	110 页码:858-864
摘要	Multilayer film's residual stress was deduced from Stoney formula. A simple stress formula, which means that multilayer residual stress can be given by the weighted average of each monolayer's residual stress, was proposed and verified through experiments on gradient diamond-like carbon (DLC) and CrN/DLC multilayers prepared by cathodic vacuum arc technology. Typical stress formulas for alternating multilayers were also investigated on corresponding DLC multilayers. Multilayer samples, together with monolayers existed in multilayers, were prepared and studied. Surface profilometry and film stress tester were used to measure films' thicknesses and residual stresses, respectively. Cross-sectional morphologies of multilayers were observed by scanning electron microscope. Results showed that the proposed stress formula was correct and could provide useful instructions on multilayer design. The formula's accuracy of predicting multilayer's residual stress through its monolayers was also investigated. In the present paper, relative errors of theoretical values were in the range of 0.2% to 10.7%, which had a strong relationship with the substrate-film interfaces. In addition, as to alternating multilayer film, its residual stress is a constant value as the number of monolayers is even; while this number is odd, multilayers' residual stress gets close to the constant value gradually and monotonously. (C) 2016 Elsevier Ltd. All rights reserved.
部门归属	[guo, c. q. ; pei, z. l. ; fan, d. ; liu, r. d. ; gong, j. ; sun, c.] chinese acad sci, inst met res, shenyang 110016, peoples r china
关键词	Residual Stress Multilayer Film Diamond-like Carbon Crn/dlc Multilayer Cathodic Vacuum Arc
学科领域	Materials Science, Multidisciplinary
资助者	National Key Basic Research Program of China (973 Program) [2012CB625100]; Natural Science Foundation of Liaoning Province of China [2013020093]
收录类别	sci
语种	英语
WOS记录号	WOS:000385600800091
引用统计	被引频次：32[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/76181
专题	中国科学院金属研究所
通讯作者	Pei, ZL; Sun, C (reprint author), Chinese Acad Sci, Inst Met Res, Shenyang 110016, Peoples R China.
推荐引用方式 GB/T 7714	Guo, CQ,Pei, ZL,Fan, D,et al. Predicting multilayer film's residual stress from its monolayers[J]. MATERIALS & DESIGN,2016,110:858-864.
APA	Guo, CQ.,Pei, ZL.,Fan, D.,Liu, RD.,Gong, J.,...&Sun, C .(2016).Predicting multilayer film's residual stress from its monolayers.MATERIALS & DESIGN,110,858-864.
MLA	Guo, CQ,et al."Predicting multilayer film's residual stress from its monolayers".MATERIALS & DESIGN 110(2016):858-864.