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Nanotwin-enhanced fatigue resistance of ultrathin Ag films for flexible electronics applications
Wan, HY; Luo, XM; Li, X; Liu, W; Zhang, GP; Zhang, GP (reprint author), Chinese Acad Sci, Inst Met Res, Shenyang Natl Lab Mat Sci, Shenyang 110016, Peoples R China.
2016-10-31
Source PublicationMATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING
ISSN0921-5093
Volume676Pages:421-426
AbstractFatigue strength and cracking behavior of ultrathin Ag films on flexible polyimide substrates were investigated. The experimental results show that the enhanced fatigue strength of the 50 nm-thick Ag films not only is caused by the increase in the yield stress and the suppression of cyclic strain localization, but also results from the severe crack deflection induced by the formation of nanotwins, which delays the fatigue crack initiation and enhances the resistance to the fatigue crack growth. The fatigue cracking mechanism for the nanocrystalline metal films is evaluated. (C) 2016 Elsevier B.V. All rights reserved.
description.department[wan, h. y. ; luo, x. m. ; li, x. ; liu, w. ; zhang, g. p.] chinese acad sci, inst met res, shenyang natl lab mat sci, shenyang 110016, peoples r china ; [wan, h. y.] univ sci & technol china, sch mat sci & engn, shenyang 110016, peoples r china
KeywordThin Film Silver Fatigue Strength Size Effect Nanotwin
Subject AreaNanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Metallurgy & Metallurgical Engineering
Funding OrganizationNational Natural Science Foundation of China (NSFC) [51371180, 51571199, 51601198]; External Cooperation Program of the Chinese Academy of Sciences [GJHZ1401]
Indexed Bysci
Language英语
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/76228
Collection中国科学院金属研究所
Corresponding AuthorZhang, GP (reprint author), Chinese Acad Sci, Inst Met Res, Shenyang Natl Lab Mat Sci, Shenyang 110016, Peoples R China.
Recommended Citation
GB/T 7714
Wan, HY,Luo, XM,Li, X,et al. Nanotwin-enhanced fatigue resistance of ultrathin Ag films for flexible electronics applications[J]. MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING,2016,676:421-426.
APA Wan, HY,Luo, XM,Li, X,Liu, W,Zhang, GP,&Zhang, GP .(2016).Nanotwin-enhanced fatigue resistance of ultrathin Ag films for flexible electronics applications.MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING,676,421-426.
MLA Wan, HY,et al."Nanotwin-enhanced fatigue resistance of ultrathin Ag films for flexible electronics applications".MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING 676(2016):421-426.
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