Improvement in Cr Nanoparticle Content in Ni-Cr Film by Co-deposition with Combined Surfactant HPB and CTAB

IMR OpenIR

	Improvement in Cr Nanoparticle Content in Ni-Cr Film by Co-deposition with Combined Surfactant HPB and CTAB
	Qin, Li-Juan; Huang, Yuan-Chao; Qin, LJ (reprint author), Chinese Acad Sci, Inst Met Res, Lab Corros & Protect, Shenyang 110016, Liaoning, Peoples R China.
	2017-10-01
发表期刊	CHINESE ACAD SCIENCES, INST METAL RESEARCH
ISSN	1006-7191
卷号	30 期号:10 页码:999-1007
摘要	The effects of single surfactant hexadecylpyridinium bromide (HPB) and cetyltrimethylammonium bromide (CTAB) and the combination of HPB and CTAB on the Cr nanoparticle content in the Ni-Cr film prepared by co-deposition were investigated. Single HPB/CTAB addition inhibited the oxidation and amorphous transformation of the Cr nanoparticles in the plating bath and effectively stabilized the Cr nanoparticles content at approximately 10 mass% as a function of time. Moreover, the combination of HPB and CTAB formed a cylindrical micelle structure on the Cr nanoparticle surface, which prompted the formation of a layer of NiCr2O4. As a result, the Cr nanoparticle content increased sharply to 20 mass%.; The effects of single surfactant hexadecylpyridinium bromide (HPB) and cetyltrimethylammonium bromide (CTAB) and the combination of HPB and CTAB on the Cr nanoparticle content in the Ni-Cr film prepared by co-deposition were investigated. Single HPB/CTAB addition inhibited the oxidation and amorphous transformation of the Cr nanoparticles in the plating bath and effectively stabilized the Cr nanoparticles content at approximately 10 mass% as a function of time. Moreover, the combination of HPB and CTAB formed a cylindrical micelle structure on the Cr nanoparticle surface, which prompted the formation of a layer of NiCr2O4. As a result, the Cr nanoparticle content increased sharply to 20 mass%.
部门归属	[qin, li-juan ; huang, yuan-chao] chinese acad sci, inst met res, lab corros & protect, shenyang 110016, liaoning, peoples r china ; [huang, yuan-chao] univ sci & technol china, coll mat sci & engn, hefei 230026, anhui, peoples r china
关键词	Co-deposition Ni-cr Film Cr Nanoparticle Content Hpb Ctab
学科领域	Metallurgy & Metallurgical Engineering
收录类别	SCI
语种	英语
WOS记录号	WOS:000414264900010
引用统计	被引频次：3[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/79057
专题	中国科学院金属研究所
通讯作者	Qin, LJ (reprint author), Chinese Acad Sci, Inst Met Res, Lab Corros & Protect, Shenyang 110016, Liaoning, Peoples R China.
推荐引用方式 GB/T 7714	Qin, Li-Juan,Huang, Yuan-Chao,Qin, LJ . Improvement in Cr Nanoparticle Content in Ni-Cr Film by Co-deposition with Combined Surfactant HPB and CTAB[J]. CHINESE ACAD SCIENCES, INST METAL RESEARCH,2017,30(10):999-1007.
APA	Qin, Li-Juan,Huang, Yuan-Chao,&Qin, LJ .(2017).Improvement in Cr Nanoparticle Content in Ni-Cr Film by Co-deposition with Combined Surfactant HPB and CTAB.CHINESE ACAD SCIENCES, INST METAL RESEARCH,30(10),999-1007.
MLA	Qin, Li-Juan,et al."Improvement in Cr Nanoparticle Content in Ni-Cr Film by Co-deposition with Combined Surfactant HPB and CTAB".CHINESE ACAD SCIENCES, INST METAL RESEARCH 30.10(2017):999-1007.