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Effect of doping SiO2 and applying high magnetic field during the film growth on structure and magnetic properties of evaporated Fe films
Liu, SY; Ma, YH; Chang, L; Li, GJ; Wang, JH; Wang, Q; Li, GJ (reprint author), Northeastern Univ, Minist Educ, Key Lab Electromagnet Proc Mat, Shenyang 110819, Liaoning, Peoples R China.
2018-04-01
Source PublicationTHIN SOLID FILMS
ISSN0040-6090
Volume651Pages:1-6
AbstractHuge difference of surface energies between dielectric and metal provides an effective method to tune the structure and magnetic properties of films. Due to the difference of surface energies between SiO2 and Fe, dopant of SiO2 with 3.6% in atomic ratio in Fe film transforms the strip and column structure in the Fe films to equiaxed crystal formed by nanoparticles of the Fe-SiO2 films. Zeeman energy of applying high magnetic field (HMF) during film growth increases Fe atomic aggregation and atomic diffusion of SiO2 into the grain boundary. This leads to the improvement of the particle size with applying HMF during the film growth. These structural evolutions have a significant effect on the performance of the films. After the dopant of SiO2, the saturation magnetization M-s of the Fe-SiO2 film (324.6 kA/m) is 73.2% less than that of the Fe films. The coercivity H-c decreases 204.0% to 788.04 A/m. However, the Ms increases 44.3% and the H-c increases 27.4% for the Fe-SiO2 film with applying HMF during the film growth.; Huge difference of surface energies between dielectric and metal provides an effective method to tune the structure and magnetic properties of films. Due to the difference of surface energies between SiO2 and Fe, dopant of SiO2 with 3.6% in atomic ratio in Fe film transforms the strip and column structure in the Fe films to equiaxed crystal formed by nanoparticles of the Fe-SiO2 films. Zeeman energy of applying high magnetic field (HMF) during film growth increases Fe atomic aggregation and atomic diffusion of SiO2 into the grain boundary. This leads to the improvement of the particle size with applying HMF during the film growth. These structural evolutions have a significant effect on the performance of the films. After the dopant of SiO2, the saturation magnetization M-s of the Fe-SiO2 film (324.6 kA/m) is 73.2% less than that of the Fe films. The coercivity H-c decreases 204.0% to 788.04 A/m. However, the Ms increases 44.3% and the H-c increases 27.4% for the Fe-SiO2 film with applying HMF during the film growth.
description.department[liu, shiying ; ma, yonghui ; chang, ling ; li, guojian ; wang, jianhao ; wang, qiang] northeastern univ, minist educ, key lab electromagnet proc mat, shenyang 110819, liaoning, peoples r china ; [ma, yonghui] chinese acad sci, inst met res, shenyang 110016, liaoning, peoples r china
KeywordTunneling Giant Magnetoresistance Fe-sio2 Granular Films Nanoparticles
Subject AreaMaterials Science, Multidisciplinary ; Materials Science, Coatings & Films ; Physics, Applied ; Physics, Condensed Matter
Funding OrganizationNational Natural Science Foundation of China [51425401]; Fundamental Research Funds for the Central Universities [N160905001, N160907001]
Indexed BySCI
Language英语
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/79408
Collection中国科学院金属研究所
Corresponding AuthorLi, GJ (reprint author), Northeastern Univ, Minist Educ, Key Lab Electromagnet Proc Mat, Shenyang 110819, Liaoning, Peoples R China.
Recommended Citation
GB/T 7714
Liu, SY,Ma, YH,Chang, L,et al. Effect of doping SiO2 and applying high magnetic field during the film growth on structure and magnetic properties of evaporated Fe films[J]. THIN SOLID FILMS,2018,651:1-6.
APA Liu, SY.,Ma, YH.,Chang, L.,Li, GJ.,Wang, JH.,...&Li, GJ .(2018).Effect of doping SiO2 and applying high magnetic field during the film growth on structure and magnetic properties of evaporated Fe films.THIN SOLID FILMS,651,1-6.
MLA Liu, SY,et al."Effect of doping SiO2 and applying high magnetic field during the film growth on structure and magnetic properties of evaporated Fe films".THIN SOLID FILMS 651(2018):1-6.
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