Fabrication of silicon-vacancy color centers in diamond films: tetramethylsilane as a new dopant source

IMR OpenIR

	Fabrication of silicon-vacancy color centers in diamond films: tetramethylsilane as a new dopant source
	Yang, B; Li, JH; Guo, L; Huang, N; Liu, LS; Zhai, ZF; Long, WJ; Jiang, X; Jiang, X (reprint author), Chinese Acad Sci, IMR, Shenyang Natl Lab Mat Sci, 72 Wenhua Rd, Shenyang 110016, Liaoning, Peoples R China.; Jiang, X (reprint author), Univ Siegen, Inst Mat Engn, Paul Bonatz Str 9-11, D-57076 Siegen, Germany.
	2018-02-28
发表期刊	CRYSTENGCOMM
ISSN	1466-8033
卷号	20 期号:8 页码:1158-1167
摘要	Color centers in diamonds hold great promise for applications in optical sensors, bio-imaging, and quantum communication. Here, we synthesize Si-doped diamond films with Si-vacancy (SiV) centers by the flow of tetramethylsilane (TMS, Si(CH3)(4)) gas using the microwave plasma chemical vapor deposition technique. In order to achieve high emission efficiency of the SiV centers, the effect of the TMS content on the microstructural evolution and photoluminescence (PL) of this type of color center is investigated using various spectroscopic techniques and high resolution transmission electron microscopy (HRTEM). The introduction of TMS gas in the diamond films leads to grain refinement of the diamond crystals and a weak SiV PL intensity located at 738 nm, at a growth temperature of 650 degrees C. For diamond films grown at 870 degrees C, the addition of Si atoms results in grain refinement and the transition of the diamond grains from micro-size without doping (no TMS) to nano-level at a Si/C ratio of 1/100. The SiV PL intensity exhibits a non-monotonic behavior with increasing Si/C ratios. At a Si/C ratio of 1/3100, the diamond film features a structure of nano-grains separated with (100) micro-grains, and displays a maximum in the PL intensity of the SiV centers: a very strong narrow peak at 738 nm with a FWHM of about 5.1 nm. Increasing the Si/C ratio promotes the formation of a nanocrystalline structure and the decrease of the SiV PL intensity. The combination of Raman spectral and HRTEM analysis implies that the PL quenching of the SiV center with the increasing Si/C ratios is attributed to the formation of amorphous carbon. Our results not only demonstrate that the diamond film, featuring a structure of nano-crystals with (100) micro-crystals, could be a promising material with high-efficiency SiV centers, but also highlight that this approach to balancing the concentration of Si impurities and the crystalline quality of the diamond films could advance the fabrication of high-emission SiV centers for optical applications.; Color centers in diamonds hold great promise for applications in optical sensors, bio-imaging, and quantum communication. Here, we synthesize Si-doped diamond films with Si-vacancy (SiV) centers by the flow of tetramethylsilane (TMS, Si(CH3)(4)) gas using the microwave plasma chemical vapor deposition technique. In order to achieve high emission efficiency of the SiV centers, the effect of the TMS content on the microstructural evolution and photoluminescence (PL) of this type of color center is investigated using various spectroscopic techniques and high resolution transmission electron microscopy (HRTEM). The introduction of TMS gas in the diamond films leads to grain refinement of the diamond crystals and a weak SiV PL intensity located at 738 nm, at a growth temperature of 650 degrees C. For diamond films grown at 870 degrees C, the addition of Si atoms results in grain refinement and the transition of the diamond grains from micro-size without doping (no TMS) to nano-level at a Si/C ratio of 1/100. The SiV PL intensity exhibits a non-monotonic behavior with increasing Si/C ratios. At a Si/C ratio of 1/3100, the diamond film features a structure of nano-grains separated with (100) micro-grains, and displays a maximum in the PL intensity of the SiV centers: a very strong narrow peak at 738 nm with a FWHM of about 5.1 nm. Increasing the Si/C ratio promotes the formation of a nanocrystalline structure and the decrease of the SiV PL intensity. The combination of Raman spectral and HRTEM analysis implies that the PL quenching of the SiV center with the increasing Si/C ratios is attributed to the formation of amorphous carbon. Our results not only demonstrate that the diamond film, featuring a structure of nano-crystals with (100) micro-crystals, could be a promising material with high-efficiency SiV centers, but also highlight that this approach to balancing the concentration of Si impurities and the crystalline quality of the diamond films could advance the fabrication of high-emission SiV centers for optical applications.
部门归属	[yang, bing ; li, junhao ; huang, nan ; liu, lusheng ; zhai, zhaofeng ; long, wenjing ; jiang, xin] chinese acad sci, imr, shenyang natl lab mat sci, 72 wenhua rd, shenyang 110016, liaoning, peoples r china ; [guo, liang] shenyang mil reg architectural design inst, south eleventh rd, shenyang 110000, liaoning, peoples r china ; [jiang, xin] univ siegen, inst mat engn, paul bonatz str 9-11, d-57076 siegen, germany
关键词	Chemical-vapor-deposition Defect Centers Photoluminescence Nanodiamonds Substrate Spectra Spin Cvd
学科领域	Chemistry, Multidisciplinary ; Crystallography
资助者	National Natural Science Foundation of China [51402309]; Youth Innovation Program of Institute of Metal Research [Y5NCA111A1, Y6NC6F1161]
收录类别	SCI
语种	英语
WOS记录号	WOS:000428453300018
引用统计	被引频次：29[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/79484
专题	中国科学院金属研究所
通讯作者	Jiang, X (reprint author), Chinese Acad Sci, IMR, Shenyang Natl Lab Mat Sci, 72 Wenhua Rd, Shenyang 110016, Liaoning, Peoples R China.; Jiang, X (reprint author), Univ Siegen, Inst Mat Engn, Paul Bonatz Str 9-11, D-57076 Siegen, Germany.
推荐引用方式 GB/T 7714	Yang, B,Li, JH,Guo, L,et al. Fabrication of silicon-vacancy color centers in diamond films: tetramethylsilane as a new dopant source[J]. CRYSTENGCOMM,2018,20(8):1158-1167.
APA	Yang, B.,Li, JH.,Guo, L.,Huang, N.,Liu, LS.,...&Jiang, X .(2018).Fabrication of silicon-vacancy color centers in diamond films: tetramethylsilane as a new dopant source.CRYSTENGCOMM,20(8),1158-1167.
MLA	Yang, B,et al."Fabrication of silicon-vacancy color centers in diamond films: tetramethylsilane as a new dopant source".CRYSTENGCOMM 20.8(2018):1158-1167.