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Dual-Additive Assisted Chemical Vapor Deposition for the Growth of Mn-Doped 2D MoS2 with Tunable Electronic Properties
Cai, Zhengyang; Shen, Tianze; Zhu, Qi; Feng, Simin; Yu, Qiangmin; Liu, Jiaman; Tang, Lei; Zhao, Yue; Wang, Jiangwei; Liu, Bilu; Cheng, Hui-Ming
2019-10-04
Source PublicationSMALL
ISSN1613-6810
AbstractDoping of bulk silicon and III-V materials has paved the foundation of the current semiconductor industry. Controlled doping of 2D semiconductors, which can also be used to tune their bandgap and type of carrier thus changing their electronic, optical, and catalytic properties, remains challenging. Here the substitutional doping of nonlike element dopant (Mn) at the Mo sites of 2D MoS2 is reported to tune its electronic and catalytic properties. The key for the successful incorporation of Mn into the MoS2 lattice stems from the development of a new growth technology called dual-additive chemical vapor deposition. First, the addition of a MnO2 additive to the MoS2 growth process reshapes the morphology and increases lateral size of Mn-doped MoS2. Second, a NaCl additive helps in promoting the substitutional doping and increases the concentration of Mn dopant to 1.7 at%. Because Mn has more valance electrons than Mo, its doping into MoS2 shifts the Fermi level toward the conduction band, resulting in improved electrical contact in field effect transistors. Mn doping also increases the hydrogen evolution activity of MoS2 electrocatalysts. This work provides a growth method for doping nonlike elements into 2D MoS2 and potentially many other 2D materials to modify their properties.
Keyworddoping dual-additive chemical vapor deposition electronic properties field effect transistors hydrogen evolution reaction MoS2
Indexed BySCI
Language英语
WOS IDWOS:000488405900001
PublisherWILEY-V C H VERLAG GMBH
Citation statistics
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/80713
Collection中国科学院金属研究所
Recommended Citation
GB/T 7714
Cai, Zhengyang,Shen, Tianze,Zhu, Qi,et al. Dual-Additive Assisted Chemical Vapor Deposition for the Growth of Mn-Doped 2D MoS2 with Tunable Electronic Properties[J]. SMALL,2019.
APA Cai, Zhengyang.,Shen, Tianze.,Zhu, Qi.,Feng, Simin.,Yu, Qiangmin.,...&Cheng, Hui-Ming.(2019).Dual-Additive Assisted Chemical Vapor Deposition for the Growth of Mn-Doped 2D MoS2 with Tunable Electronic Properties.SMALL.
MLA Cai, Zhengyang,et al."Dual-Additive Assisted Chemical Vapor Deposition for the Growth of Mn-Doped 2D MoS2 with Tunable Electronic Properties".SMALL (2019).
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