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Correlation between Passivity Breakdown and Composition of Passive Film Formed on Alloy 690 Studied by Sputtering XPS and FIB-HRTEM
Wang, Yicheng; Song, Shizhe; Wang, Jianqiu; Behnamian, Yashar; Xu, Likun; Fan, Hongqiang; Xia, Da-Hai
2019-07-26
Source PublicationJOURNAL OF THE ELECTROCHEMICAL SOCIETY
ISSN0013-4651
Volume166Issue:12Pages:C332-C344
AbstractPassivity film breakdown on steam generator (SG) tubing alloys in Cl- + S2O32- solutions were investigated using a focused ion beam (FIB) and high resolution transmission electron microscopy (HRTEM), and a correlation between passivity film breakdown and film composition was established. Sulfur was not incorporated into the passive film that formed on the alloy. S2O32- adsorbed on the passive film surface was subsequently electrochemically reduced caused by SG alloy, leading to selective dissolution of Ni from the passive film. Fe, Ni, and Cr in the passive film have complex effects on corrosion resistance, which is highly dependent on temperature, and the Cl-/S2O32- concentration ratio. (c) The Author(s) 2019. Published by ECS.
Indexed BySCI
Language英语
WOS IDWOS:000477772300001
PublisherELECTROCHEMICAL SOC INC
Citation statistics
Cited Times:3[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/80892
Collection中国科学院金属研究所
Recommended Citation
GB/T 7714
Wang, Yicheng,Song, Shizhe,Wang, Jianqiu,et al. Correlation between Passivity Breakdown and Composition of Passive Film Formed on Alloy 690 Studied by Sputtering XPS and FIB-HRTEM[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY,2019,166(12):C332-C344.
APA Wang, Yicheng.,Song, Shizhe.,Wang, Jianqiu.,Behnamian, Yashar.,Xu, Likun.,...&Xia, Da-Hai.(2019).Correlation between Passivity Breakdown and Composition of Passive Film Formed on Alloy 690 Studied by Sputtering XPS and FIB-HRTEM.JOURNAL OF THE ELECTROCHEMICAL SOCIETY,166(12),C332-C344.
MLA Wang, Yicheng,et al."Correlation between Passivity Breakdown and Composition of Passive Film Formed on Alloy 690 Studied by Sputtering XPS and FIB-HRTEM".JOURNAL OF THE ELECTROCHEMICAL SOCIETY 166.12(2019):C332-C344.
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