Knowledge Management System Of Institute of metal research，CAS
| On-Demand Preparation of alpha-Phase-Dominated Tungsten Films for Highly Qualified Thermal Reflectors | |
| Wang, Xiaoyu; Zang, Rui; Gao, Junhua; Liu, Chen; Wang, Lei; Gong, Wenbin; Zha, Xianhu; Chen, Xingqiu; Huang, Feng; Javaid, Kashif; Xu, Zhi; Cao, Hongtao; Rogachev, Alexander A. | |
| 2019-06-01 | |
| Source Publication | ADVANCED MATERIALS INTERFACES
 |
| ISSN | 2196-7350 |
| Volume | 6Issue:11 |
| Abstract | Phase-structure diversity affords tungsten thin films with fascinating physical/chemical properties for varied applications. However, the on-demand preparation of W films with specific phase is still an important but unmet scientific issue. In this report, an easy-to-achieve preparation recipe is implemented for addressing the phase tailoring of tungsten films. The phase transformation evolution during deposition is governed by enhanced diffusion of W adatoms and selective atomic etching on the crystal planes. It is experimentally demonstrated that the orientation relation between {210}(beta) and {110}(alpha) planes plays a vital role in coupling with the competitive growth behaviors between beta- and alpha-W. The phase-dependent electrical/optical properties of W films are experimentally observed and unambiguously figured out by theoretical simulations. Alpha-phase-dominated W films are prepared successfully under relatively tolerant conditions, demonstrating a low resistivity of approximate to 13.6 mu omega cm and a high infrared reflectance larger than 93%. Alpha-W also serves as thermal reflector to construct a solar absorber, exhibiting a low thermal emissivity of approximate to 9.8%@500 degrees C. Understanding the (alpha, beta) phase transformation mechanism means a big step forward in the development of the on-demand preparation, which allows to build a scalable platform for making W films with specific phase in a more controllable way. |
| Keyword | first-principles calculation infrared reflectance phase transformation resistivity thermal reflector tungsten thin film |
| Indexed By | SCI |
| Language | 英语 |
| WOS ID | WOS:000471079000015 |
| Publisher | WILEY |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.imr.ac.cn/handle/321006/81033 |
| Collection | 中国科学院金属研究所 |
| Recommended Citation GB/T 7714 | Wang, Xiaoyu,Zang, Rui,Gao, Junhua,et al. On-Demand Preparation of alpha-Phase-Dominated Tungsten Films for Highly Qualified Thermal Reflectors[J]. ADVANCED MATERIALS INTERFACES,2019,6(11). |
| APA | Wang, Xiaoyu.,Zang, Rui.,Gao, Junhua.,Liu, Chen.,Wang, Lei.,...&Rogachev, Alexander A..(2019).On-Demand Preparation of alpha-Phase-Dominated Tungsten Films for Highly Qualified Thermal Reflectors.ADVANCED MATERIALS INTERFACES,6(11). |
| MLA | Wang, Xiaoyu,et al."On-Demand Preparation of alpha-Phase-Dominated Tungsten Films for Highly Qualified Thermal Reflectors".ADVANCED MATERIALS INTERFACES 6.11(2019). |
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