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Reactive sputter deposition of WO3 films by using two deposition methods
Yasuda, Yoji; Hoshi, Yoichi; Kobayashi, Shin-ichi; Uchida, Takayuki; Sawada, Yutaka; Wang, Meihan; Lei, Hao
2019-05-01
Source PublicationJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
ISSN0734-2101
Volume37Issue:3
AbstractTungsten-trioxide (WO3) films were deposited using two types of sputtering systems: a planar magnetron sputtering system and a facing-target sputtering (FTS) system. The structure and gasochromic properties of the resulting films were compared, and film uniformity and gasochromic properties were found to be significantly improved when using FTS because the incidence of high-energy negative oxygen ions on the substrate during sputtering was significantly suppressed. The authors confirmed that the deposition rate of WO3 films increased by hundreds of times with an increase of the sputtering voltage from 500 to 800 V in the FTS system, and a deposition rate above 100 nm/min was easily achieved. The authors clarified that the deposition rate of the WO3 film strongly depends on the sputtering voltage under the condition of a constant sputtering current. Published by the AVS.
Indexed BySCI
Language英语
WOS IDWOS:000472182400032
PublisherA V S AMER INST PHYSICS
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Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/81116
Collection中国科学院金属研究所
Recommended Citation
GB/T 7714
Yasuda, Yoji,Hoshi, Yoichi,Kobayashi, Shin-ichi,et al. Reactive sputter deposition of WO3 films by using two deposition methods[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,2019,37(3).
APA Yasuda, Yoji.,Hoshi, Yoichi.,Kobayashi, Shin-ichi.,Uchida, Takayuki.,Sawada, Yutaka.,...&Lei, Hao.(2019).Reactive sputter deposition of WO3 films by using two deposition methods.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,37(3).
MLA Yasuda, Yoji,et al."Reactive sputter deposition of WO3 films by using two deposition methods".JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 37.3(2019).
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