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Electrochromic Properties of Nanostructured WO3 Thin Films Deposited by Glancing-Angle Magnetron Sputtering
Wang, Meihan; Chen, Yun; Gao, Bowen; Lei, Hao
2019-05-01
Source PublicationADVANCED ELECTRONIC MATERIALS
ISSN2199-160X
Volume5Issue:5
AbstractTungsten oxide thin films are prepared by glancing-angle reactive magnetron sputtering at room temperature. The surface and cross-section morphologies are characterized by FE-SEM and TEM. The electrochromic properties of the thin films are studied using a three-electrode system in 1 m LiClO4/PC solution. When the glancing angle is kept at 80 degrees, a nanocolumnar structured film is obtained. This nanocolumnar structured film shows a lower driving potential and better stability compared to the dense film. The charge capacity per unit area of the nanocolumnar structured film is determined to be 30.85 mc cm(-2). The diffusion rates of injection and detachment of ions are determined to be D-in = 6.57 x 10(-10) cm(2) s(-1) and D-de = 6.55 x 10(-10) cm(2) s(-1) under an applied potential of +/- 1.2 V, respectively. The optical modulation amplitude of the nanocolumnar structured film reaches 65% at a wavelength of 600 nm and the optical density is superior to that of the dense film.
Keywordelectrochromic glancing angle magnetron sputtering nanostructured WO3 thin films
Indexed BySCI
Language英语
WOS IDWOS:000471812600004
PublisherWILEY
Citation statistics
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/81117
Collection中国科学院金属研究所
Recommended Citation
GB/T 7714
Wang, Meihan,Chen, Yun,Gao, Bowen,et al. Electrochromic Properties of Nanostructured WO3 Thin Films Deposited by Glancing-Angle Magnetron Sputtering[J]. ADVANCED ELECTRONIC MATERIALS,2019,5(5).
APA Wang, Meihan,Chen, Yun,Gao, Bowen,&Lei, Hao.(2019).Electrochromic Properties of Nanostructured WO3 Thin Films Deposited by Glancing-Angle Magnetron Sputtering.ADVANCED ELECTRONIC MATERIALS,5(5).
MLA Wang, Meihan,et al."Electrochromic Properties of Nanostructured WO3 Thin Films Deposited by Glancing-Angle Magnetron Sputtering".ADVANCED ELECTRONIC MATERIALS 5.5(2019).
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