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Experiments and theoretical explanation of droplet elimination phenomenon in pulsed-bias arc deposition
Lin, GQ; Zhao, YH; Guo, HM; Wang, DZ; Dong, C; Huang, RF; Wen, LS
通讯作者Dong, C()
2004-07-01
发表期刊JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
ISSN0734-2101
卷号22期号:4页码:1218-1222
摘要TiN films on stainless steel have been synthesized by arc deposition with dc and pulsed biases. We show that at the same bias (-300 V), coarse particles on the film surface are significantly decreased both in size and in amount, if the bias is pulsed. In order to clarify the related process, we have analyzed, using orthogonal design, the influences from different working parameters. We show that the parameters related to the pulsed bias such as magnitude and duty cycle have important effects on the size distribution of the particles. According to our theoretical calculations based on plasma sheath and dust plasma theories, the origin of the droplet elimination lies in enhanced repulsion of the negatively charged droplets in pulsed plasma. (C) 2004 American Vacuum Society.
DOI10.1116/1.1761071
收录类别SCI
语种英语
WOS研究方向Materials Science ; Physics
WOS类目Materials Science, Coatings & Films ; Physics, Applied
WOS记录号WOS:000223322000024
出版者A V S AMER INST PHYSICS
引用统计
被引频次:41[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.imr.ac.cn/handle/321006/81255
专题中国科学院金属研究所
通讯作者Dong, C
作者单位1.Dalian Univ Technol, State Key Lab Mat Modificat, Dalian 116024, Peoples R China
2.Chinese Acad Sci, Met Res Inst, Shenyang 110000, Peoples R China
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GB/T 7714
Lin, GQ,Zhao, YH,Guo, HM,et al. Experiments and theoretical explanation of droplet elimination phenomenon in pulsed-bias arc deposition[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,2004,22(4):1218-1222.
APA Lin, GQ.,Zhao, YH.,Guo, HM.,Wang, DZ.,Dong, C.,...&Wen, LS.(2004).Experiments and theoretical explanation of droplet elimination phenomenon in pulsed-bias arc deposition.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,22(4),1218-1222.
MLA Lin, GQ,et al."Experiments and theoretical explanation of droplet elimination phenomenon in pulsed-bias arc deposition".JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 22.4(2004):1218-1222.
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