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Thermal Stability of WB2 and W-B-N Films Deposited by Magnetron Sputtering
Liu, Yan-Ming; Li, Tong; Liu, Feng; Pei, Zhi-Liang
2019
Source PublicationACTA METALLURGICA SINICA-ENGLISH LETTERS
ISSN1006-7191
Volume32Issue:1Pages:136-144
AbstractThe work is mainly to study the thermal stability including the phase stability, microstructure and tribo-mechanical properties of the AlB2-type WB2 and W-B-N (5.6at.% N) films annealed in vacuum at various temperatures, which are deposited on Si and GY8 substrates by magnetron sputtering. For the WB2 and W-B-N films deposited on Si wafers, as the annealing temperature increases from 700 to 1000 degrees C, a-WB (700 degrees C) and Mo2B5-type WB2 (1000 degrees C) are successively observed in the AlB2-type WB2 films, which show many cracks at the temperature 800 degrees C resulting in the performance failure; by contrast, only slight -WB is observed at 1000 degrees C in the W-B-N films due to the stabilization effect of a-BN phase, and the hardness increases to 34.1GPa first due to the improved crystallinity and then decreases to 31.5GPa ascribed to the formation of -WB. For the WB2 and the W-B-N films deposited on WC-Co substrates, both the WB2 and W-B-N films react with the YG8 (WC-Co) substrates leading to the formation of CoWB, CoW2B2 and CoW3B3 with the annealing temperature increasing to 900 degrees C; a large number of linear cracks occur on the surface of these two films annealed at 800 degrees C leading to the film failure; after vacuum annealing at 700 degrees C, the friction performance of the W-B-N films is higher than that of the deposited W-B-N films, while the wear resistance of the WB2 films shows a slight decrease compared with that of the deposited WB2 films.
KeywordAlB2-type WB2 films W-B-N films Magnetron sputtering Thermal stability Mechanical properties
Indexed BySCI
Language英语
WOS IDWOS:000455515500014
PublisherCHINESE ACAD SCIENCES, INST METAL RESEARCH
Citation statistics
Cited Times:2[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/81495
Collection中国科学院金属研究所
Recommended Citation
GB/T 7714
Liu, Yan-Ming,Li, Tong,Liu, Feng,et al. Thermal Stability of WB2 and W-B-N Films Deposited by Magnetron Sputtering[J]. ACTA METALLURGICA SINICA-ENGLISH LETTERS,2019,32(1):136-144.
APA Liu, Yan-Ming,Li, Tong,Liu, Feng,&Pei, Zhi-Liang.(2019).Thermal Stability of WB2 and W-B-N Films Deposited by Magnetron Sputtering.ACTA METALLURGICA SINICA-ENGLISH LETTERS,32(1),136-144.
MLA Liu, Yan-Ming,et al."Thermal Stability of WB2 and W-B-N Films Deposited by Magnetron Sputtering".ACTA METALLURGICA SINICA-ENGLISH LETTERS 32.1(2019):136-144.
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