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Calculation on deposited temperature during pulsed bias arc ion plating
Bai, X; Lin, GQ; Dong, C; Wen, LS
Corresponding AuthorLin, GQ()
2004-10-11
Source PublicationACTA METALLURGICA SINICA
ISSN0412-1961
Volume40Issue:10Pages:1069-1073
AbstractThe influencing factors and their weights on deposited temperature have been studied in detail during pulsed bias arc ion plating (PBAIP). Based on the model of deposited temperature calculation in arc ion plating (AIP), and under the condition of the rectangle substrate voltage waveforms, the input power intensity, of ion bombardment in PBAIP can be equal to the product of the input power in AIP and duty cycle in PBAIR On the basis of energy conversation principle, a substrate temperature calculation model for PBAIP is established when the bias voltage varies from -1000 V to 0. Experiments are also used to verify the calculated results and a good agreement is obtained.
Keywordarc ion plating pulsed bias deposited temperature calculation
Indexed BySCI
Language英语
WOS Research AreaMetallurgy & Metallurgical Engineering
WOS SubjectMetallurgy & Metallurgical Engineering
WOS IDWOS:000224871300012
PublisherSCIENCE CHINA PRESS
Citation statistics
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/81531
Corresponding AuthorLin, GQ
Affiliation1.Dalian Univ Technol, State Key Lab Mat Modificat Laser Ion & Electron, Dalian 116024, Peoples R China
2.Chinese Acad Sci, Inst Met Res, Shenyang 110016, Peoples R China
Recommended Citation
GB/T 7714
Bai, X,Lin, GQ,Dong, C,et al. Calculation on deposited temperature during pulsed bias arc ion plating[J]. ACTA METALLURGICA SINICA,2004,40(10):1069-1073.
APA Bai, X,Lin, GQ,Dong, C,&Wen, LS.(2004).Calculation on deposited temperature during pulsed bias arc ion plating.ACTA METALLURGICA SINICA,40(10),1069-1073.
MLA Bai, X,et al."Calculation on deposited temperature during pulsed bias arc ion plating".ACTA METALLURGICA SINICA 40.10(2004):1069-1073.
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