Calculation on deposited temperature during pulsed bias arc ion plating

IMR OpenIR

	Calculation on deposited temperature during pulsed bias arc ion plating
	Bai, X ; Lin, GQ ; Dong, C ; Wen, LS
通讯作者	Lin, GQ()
	2004-10-11
发表期刊	ACTA METALLURGICA SINICA
ISSN	0412-1961
卷号	40 期号:10 页码:1069-1073
摘要	The influencing factors and their weights on deposited temperature have been studied in detail during pulsed bias arc ion plating (PBAIP). Based on the model of deposited temperature calculation in arc ion plating (AIP), and under the condition of the rectangle substrate voltage waveforms, the input power intensity, of ion bombardment in PBAIP can be equal to the product of the input power in AIP and duty cycle in PBAIR On the basis of energy conversation principle, a substrate temperature calculation model for PBAIP is established when the bias voltage varies from -1000 V to 0. Experiments are also used to verify the calculated results and a good agreement is obtained.
关键词	arc ion plating pulsed bias deposited temperature calculation
收录类别	SCI
语种	英语
WOS研究方向	Metallurgy & Metallurgical Engineering
WOS类目	Metallurgy & Metallurgical Engineering
WOS记录号	WOS:000224871300012
出版者	SCIENCE CHINA PRESS
引用统计
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/81531
通讯作者	Lin, GQ
作者单位	1.Dalian Univ Technol, State Key Lab Mat Modificat Laser Ion & Electron, Dalian 116024, Peoples R China 2.Chinese Acad Sci, Inst Met Res, Shenyang 110016, Peoples R China
推荐引用方式 GB/T 7714	Bai, X,Lin, GQ,Dong, C,et al. Calculation on deposited temperature during pulsed bias arc ion plating[J]. ACTA METALLURGICA SINICA,2004,40(10):1069-1073.
APA	Bai, X,Lin, GQ,Dong, C,&Wen, LS.(2004).Calculation on deposited temperature during pulsed bias arc ion plating.ACTA METALLURGICA SINICA,40(10),1069-1073.
MLA	Bai, X,et al."Calculation on deposited temperature during pulsed bias arc ion plating".ACTA METALLURGICA SINICA 40.10(2004):1069-1073.