Calculation on deposited temperature during pulsed bias arc ion plating | |
Bai, X; Lin, GQ; Dong, C; Wen, LS | |
Corresponding Author | Lin, GQ() |
2004-10-11 | |
Source Publication | ACTA METALLURGICA SINICA
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ISSN | 0412-1961 |
Volume | 40Issue:10Pages:1069-1073 |
Abstract | The influencing factors and their weights on deposited temperature have been studied in detail during pulsed bias arc ion plating (PBAIP). Based on the model of deposited temperature calculation in arc ion plating (AIP), and under the condition of the rectangle substrate voltage waveforms, the input power intensity, of ion bombardment in PBAIP can be equal to the product of the input power in AIP and duty cycle in PBAIR On the basis of energy conversation principle, a substrate temperature calculation model for PBAIP is established when the bias voltage varies from -1000 V to 0. Experiments are also used to verify the calculated results and a good agreement is obtained. |
Keyword | arc ion plating pulsed bias deposited temperature calculation |
Indexed By | SCI |
Language | 英语 |
WOS Research Area | Metallurgy & Metallurgical Engineering |
WOS Subject | Metallurgy & Metallurgical Engineering |
WOS ID | WOS:000224871300012 |
Publisher | SCIENCE CHINA PRESS |
Citation statistics | |
Document Type | 期刊论文 |
Identifier | http://ir.imr.ac.cn/handle/321006/81531 |
Corresponding Author | Lin, GQ |
Affiliation | 1.Dalian Univ Technol, State Key Lab Mat Modificat Laser Ion & Electron, Dalian 116024, Peoples R China 2.Chinese Acad Sci, Inst Met Res, Shenyang 110016, Peoples R China |
Recommended Citation GB/T 7714 | Bai, X,Lin, GQ,Dong, C,et al. Calculation on deposited temperature during pulsed bias arc ion plating[J]. ACTA METALLURGICA SINICA,2004,40(10):1069-1073. |
APA | Bai, X,Lin, GQ,Dong, C,&Wen, LS.(2004).Calculation on deposited temperature during pulsed bias arc ion plating.ACTA METALLURGICA SINICA,40(10),1069-1073. |
MLA | Bai, X,et al."Calculation on deposited temperature during pulsed bias arc ion plating".ACTA METALLURGICA SINICA 40.10(2004):1069-1073. |
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