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Copper doping in titanium oxide catalyst film prepared by dc reactive magnetron sputtering
Zhang, WJ; Li, Y; Zhu, SL; Wang, FH
Corresponding AuthorZhang, WJ(wjzhang@imr.ac.cn)
2004-09-01
Source PublicationCATALYSIS TODAY
ISSN0920-5861
Volume93-5Pages:589-594
AbstractCopper-doped titanium oxide films were prepared by dc magnetron sputtering using Ti and Cu mixed target. The XPS spectra showed that titanium was in the Ti4+ oxidation state and oxygen was in the form of O2- in TiO2 and CuO. Apparent high-intensity shake-up satellites of the main Cu 2p peaks indicated the existence of fully oxidized CuO in the Cu-doped TiO2 films. When the copper concentration was low, the Cu-doped TiO2 film had the similar anatase phase as pure TiO2. The samples became amorphous when copper concentration was more than 15.17 at.%. Copper oxides were in the amorphous state in all the films. In the sequence of decreasing copper concentration, the surface morphologies changed from flat to nano-crystalline with nano-sized pores. The absorption edges of the Cu-doped samples shifted to longer wavelength region and the optical transmittances of these films decreased abruptly with increasing copper concentration. The Cu-doped TiO2 films had different photocatalytic behavior in accordance with the amount of doped copper. The best copper doping concentration was 1.45 at.% in sample I, relating to the most effective photocatalytic activity. (C) 2004 Elsevier B.V. All rights reserved.
KeywordTiO2 film reactive magnetron sputtering copper doping photocatalytic activity
DOI10.1016/j.cattod.2004.06.009
Indexed BySCI
Language英语
WOS Research AreaChemistry ; Engineering
WOS SubjectChemistry, Applied ; Chemistry, Physical ; Engineering, Chemical
WOS IDWOS:000223973200083
PublisherELSEVIER SCIENCE BV
Citation statistics
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/81821
Corresponding AuthorZhang, WJ
Affiliation1.Chinese Acad Sci, Inst Met Res, State Key Lab Corros & Protect, Shenyang 110016, Peoples R China
2.Shenyang Inst Technol, Shenyang 110016, Peoples R China
Recommended Citation
GB/T 7714
Zhang, WJ,Li, Y,Zhu, SL,et al. Copper doping in titanium oxide catalyst film prepared by dc reactive magnetron sputtering[J]. CATALYSIS TODAY,2004,93-5:589-594.
APA Zhang, WJ,Li, Y,Zhu, SL,&Wang, FH.(2004).Copper doping in titanium oxide catalyst film prepared by dc reactive magnetron sputtering.CATALYSIS TODAY,93-5,589-594.
MLA Zhang, WJ,et al."Copper doping in titanium oxide catalyst film prepared by dc reactive magnetron sputtering".CATALYSIS TODAY 93-5(2004):589-594.
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