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电弧离子镀制备致密MCrAlRe型涂层的方法
沈明礼; 王世臣; 朱圣龙; 王福会
2018-09-04
Rights Holder中国科学院金属研究所
Subtype发明专利
Patent Number201410591720.X
Document Type专利
Identifierhttp://ir.imr.ac.cn/handle/321006/81986
Collection中国科学院金属研究所
Recommended Citation
GB/T 7714
沈明礼,王世臣,朱圣龙,等. 电弧离子镀制备致密MCrAlRe型涂层的方法. 201410591720.X[P]. 2018-09-04.
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