Some fundamental problems of pulse biased arc ion plating

doi:10.1016/j.surfcoat.2004.08.123

IMR OpenIR

	Some fundamental problems of pulse biased arc ion plating
	Wen, LS; Huang, RF
通讯作者	Wen, LS(lswen@imr.ac.cn)
	2005-04-01
发表期刊	SURFACE & COATINGS TECHNOLOGY
ISSN	0257-8972
卷号	193 期号:1-3 页码:1-5
摘要	Recent progresses in both fundamentals and technology of pulse biased arc ion plating (PBAIP) are described. They scope from thermodynamic nature of deposition technology to low temperature plasma physical features. The later includes plasma sheath, dust particles and electromagnetic analysis of pulse biased arc ion plating circuit. (c) 2004 Elsevier B.V. All rights reserved.
关键词	thermodynamic nature of vapor deposition plasma sheath dust particles in plasma oscillations in biased arc plasma circuit
DOI	10.1016/j.surfcoat.2004.08.123
收录类别	SCI
语种	英语
WOS研究方向	Materials Science ; Physics
WOS类目	Materials Science, Coatings & Films ; Physics, Applied
WOS记录号	WOS:000227482300002
出版者	ELSEVIER SCIENCE SA
引用统计	被引频次：4[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/82218
专题	中国科学院金属研究所
通讯作者	Wen, LS
作者单位	Chinese Acad Sci, Inst Met Res, YKH Surface Engn, Hunan, Peoples R China
推荐引用方式 GB/T 7714	Wen, LS,Huang, RF. Some fundamental problems of pulse biased arc ion plating[J]. SURFACE & COATINGS TECHNOLOGY,2005,193(1-3):1-5.
APA	Wen, LS,&Huang, RF.(2005).Some fundamental problems of pulse biased arc ion plating.SURFACE & COATINGS TECHNOLOGY,193(1-3),1-5.
MLA	Wen, LS,et al."Some fundamental problems of pulse biased arc ion plating".SURFACE & COATINGS TECHNOLOGY 193.1-3(2005):1-5.